Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00552189" target="_blank" >RIV/68378271:_____/21:00552189 - isvavai.cz</a>
Alternative codes found
RIV/61989592:15310/21:73610034
Result on the web
<a href="https://doi.org/10.1063/5.0046829" target="_blank" >https://doi.org/10.1063/5.0046829</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/5.0046829" target="_blank" >10.1063/5.0046829</a>
Alternative languages
Result language
angličtina
Original language name
Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma
Original language description
A plasma-assisted atomic layer deposition system employing a microwave surfatron plasma was developed and characterized by spatially resolved Langmuir probe diagnostics and optical emission spectroscopy. The deposition process was applied on TiO2 thin films prepared on Si wafers. The surfatron is equipped with a small ring electrode serving as a source of weak radio frequency plasma helping with fast and reliable ignition of the discharge in molecular gas. Results evaluated in the pure argon plasma proved that the plasma potential and the plasma density are homogeneous in the radial direction, while a rapid decrease was observed in the axial direction. Adding up to 30% of nitrogen into the gas mixture led to less homogeneous plasma parameters in the radial direction together with the increase of the electron effective temperature. Optical emission spectra revealed many Ar I lines of neutral atoms with only a few Ar II ions’ lines.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
1089-7550
Volume of the periodical
130
Issue of the periodical within the volume
1
Country of publishing house
US - UNITED STATES
Number of pages
18
Pages from-to
013301
UT code for WoS article
000668677200001
EID of the result in the Scopus database
2-s2.0-85109035104