Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00562485" target="_blank" >RIV/68378271:_____/22:00562485 - isvavai.cz</a>
Alternative codes found
RIV/61989592:15310/22:73617301
Result on the web
<a href="https://doi.org/10.1116/6.0002012" target="_blank" >https://doi.org/10.1116/6.0002012</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/6.0002012" target="_blank" >10.1116/6.0002012</a>
Alternative languages
Result language
angličtina
Original language name
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
Original language description
Tungsten oxide films are deposited with the help of reactive magnetron sputtering in an argon/oxygen gas mixture. Films are deposited on different substrates, in particular, on soda lime glass, fluorine-doped tin oxide coated glass, silicon (Si), and quartz (SiO2).
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films
ISSN
0734-2101
e-ISSN
1520-8559
Volume of the periodical
40
Issue of the periodical within the volume
6
Country of publishing house
US - UNITED STATES
Number of pages
7
Pages from-to
063402
UT code for WoS article
000892443000001
EID of the result in the Scopus database
2-s2.0-85139862837