Optical anisotropy of glancing angle deposited thin films on nano-patterned substrates

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00566321" target="_blank" >RIV/68378271:_____/22:00566321 - isvavai.cz</a>
Result on the web
<a href="https://hdl.handle.net/11104/0337688" target="_blank" >https://hdl.handle.net/11104/0337688</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1364/OME.451669" target="_blank" >10.1364/OME.451669</a>

Result language
angličtina
Original language name
Optical anisotropy of glancing angle deposited thin films on nano-patterned substrates
Original language description
This study has demonstrated that 3D columnar micro-films/coatings can be deposited over pre-patterned surfaces with sub-micrometer periodic patterns. Four-angle polarisation analysis of thin (0.4 − 1∼µm) Si and SiO2 films, evaporated via glancing angle deposition (GLAD) at 70° to the normal, was carried out in reflection mode using synchrotron infrared microspectroscopy at the Australian Synchrotron. The angular dependence of absorbance followed A(θ) ∝ cos 2 θ, confirmed for Si substrates patterned by electron beam lithography and plasma etching, which were used to make checkerboard patterns of Λ = 0.4∼µm period on Si. Retardance control by birefringence of a patterned SiO2 substrate coated by columnar SiO2 is promising for UV-visible applications due to the use of the same material to endow polarisation control.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10306 - Optics (including laser optics and quantum optics)

Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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