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Silicon nanocrystal synthesis with the atmospheric plasma source HelixJet

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00570403" target="_blank" >RIV/68378271:_____/23:00570403 - isvavai.cz</a>

  • Result on the web

    <a href="https://hdl.handle.net/11104/0341712" target="_blank" >https://hdl.handle.net/11104/0341712</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1002/ppap.202200129" target="_blank" >10.1002/ppap.202200129</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Silicon nanocrystal synthesis with the atmospheric plasma source HelixJet

  • Original language description

    The HelixJet, a plasma source operating under atmospheric pressure with RF power, was used for the synthesis of silicon nanoparticles (Si-NPs) in the context of relevance in nanomedicine, sensor technology and nanotechnology. The HelixJet was operated with a variety of He/Ar/H2/SiH4 gas mixtures to characterize the Si-NPs in regards to their size, crystallinity, structure and photoluminescence. Admixture of H2 alongside high RF powers led to the formation of crystalline nanoparticles with a strong photoluminescence intensity, where the photoluminescence properties as well as the nanocrystal synthesis yield were tunable by adjustment of the synthesis parameters. In addition, the experiments conducted in this study resulted in a design improvement of the HelixJet plasma source that extends the stability of the operating range.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    21001 - Nano-materials (production and properties)

Result continuities

  • Project

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2023

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Processes and Polymers

  • ISSN

    1612-8850

  • e-ISSN

    1612-8869

  • Volume of the periodical

    20

  • Issue of the periodical within the volume

    2

  • Country of publishing house

    DE - GERMANY

  • Number of pages

    13

  • Pages from-to

    2200129

  • UT code for WoS article

    000876770100001

  • EID of the result in the Scopus database

    2-s2.0-85141372419