Silicon nanocrystal synthesis with the atmospheric plasma source HelixJet
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00570403" target="_blank" >RIV/68378271:_____/23:00570403 - isvavai.cz</a>
Result on the web
<a href="https://hdl.handle.net/11104/0341712" target="_blank" >https://hdl.handle.net/11104/0341712</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ppap.202200129" target="_blank" >10.1002/ppap.202200129</a>
Alternative languages
Result language
angličtina
Original language name
Silicon nanocrystal synthesis with the atmospheric plasma source HelixJet
Original language description
The HelixJet, a plasma source operating under atmospheric pressure with RF power, was used for the synthesis of silicon nanoparticles (Si-NPs) in the context of relevance in nanomedicine, sensor technology and nanotechnology. The HelixJet was operated with a variety of He/Ar/H2/SiH4 gas mixtures to characterize the Si-NPs in regards to their size, crystallinity, structure and photoluminescence. Admixture of H2 alongside high RF powers led to the formation of crystalline nanoparticles with a strong photoluminescence intensity, where the photoluminescence properties as well as the nanocrystal synthesis yield were tunable by adjustment of the synthesis parameters. In addition, the experiments conducted in this study resulted in a design improvement of the HelixJet plasma source that extends the stability of the operating range.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
21001 - Nano-materials (production and properties)
Result continuities
Project
—
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
1612-8869
Volume of the periodical
20
Issue of the periodical within the volume
2
Country of publishing house
DE - GERMANY
Number of pages
13
Pages from-to
2200129
UT code for WoS article
000876770100001
EID of the result in the Scopus database
2-s2.0-85141372419