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Influence of gas composition on growth of boron-doped diamond films

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00575391" target="_blank" >RIV/68378271:_____/23:00575391 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Influence of gas composition on growth of boron-doped diamond films

  • Original language description

    Boron-doped diamond films (BDD) have recently attracted interest in many areas of R&D. In this contribution, we present the influence of gas composition on the crystal evolution of BDD films grown in a focused microwave plasma system. BDD films with a constant B/C ratio (2000 ppm) were successfully grown over a wide range of CH4 concentrations from 1.5 to 18 %. BDD kept its microcrystalline character up to a CH4 content as high as 9 %. The microcrystalline morphology changed to nanocrystalline at CH4 concentrations from 12 to 15 %. Finally, higher CH4 content than >15 % led to needle-like BDD. The effect of the gas mixture on the BDD film properties is discussed in terms of surface morphology (scanning electron microscopy, SEM), chemical composition (Raman spectroscopy), electrical conductivity (Hall and four-point measurement), and growth rate.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    20506 - Coating and films

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2023

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proceedings of ADEPT - ADEPT 2023

  • ISBN

    978-80-554-1977-0

  • ISSN

  • e-ISSN

  • Number of pages

    5

  • Pages from-to

    225-229

  • Publisher name

    University of Žilina

  • Place of publication

    Žilina

  • Event location

    Podbanské

  • Event date

    Jun 12, 2023

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article