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Femtosecond laser crystallization of ultrathin a-Ge films in multilayer stacks with silicon layers

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00640161" target="_blank" >RIV/68378271:_____/25:00640161 - isvavai.cz</a>

  • Alternative codes found

    RIV/68407700:21340/25:00386373

  • Result on the web

    <a href="https://hdl.handle.net/11104/0370584" target="_blank" >https://hdl.handle.net/11104/0370584</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.3390/app152011082" target="_blank" >10.3390/app152011082</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Femtosecond laser crystallization of ultrathin a-Ge films in multilayer stacks with silicon layers

  • Original language description

    Ultrashort pulsed laser annealing is an efficient technique for crystallizing amorphous semiconductors with the possibility to obtain polycrystalline films at low temperatures, below the melting point, through non-thermal processes. Here, a multilayer structure consisting of alternating amorphous silicon and germanium films was annealed by mid-infrared (1500 nm) ultrashort (70 fs) laser pulses under single-shot and multi-shot irradiation conditions. We investigate selective crystallization of ultrathin (3.5 nm) a-Ge non-hydrogenated films, which are promising for the generation of highly photostable nanodots. Based on Raman spectroscopy analysis, we demonstrate that, in contrast to thicker (above 10 nm) Ge films, explosive stress-induced crystallization is suppressed in such ultrathin systems and proceeds via thermal melting. This is likely due to the islet structure of ultrathin films, which results in the formation of nanopores at the Si-Ge interface and reduces stress confinement during ultrashort laser heating.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    21001 - Nano-materials (production and properties)

Result continuities

  • Project

    <a href="/en/project/EH22_008%2F0004596" target="_blank" >EH22_008/0004596: Sensors and Detectors for Future Information Society</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2025

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Applied Sciences-Basel

  • ISSN

    2076-3417

  • e-ISSN

    2076-3417

  • Volume of the periodical

    15

  • Issue of the periodical within the volume

    20

  • Country of publishing house

    CH - SWITZERLAND

  • Number of pages

    12

  • Pages from-to

    11082

  • UT code for WoS article

    001602625200001

  • EID of the result in the Scopus database

    2-s2.0-105020242522