Laser deposition of CN x films combined with RF and hollow cathode discharges.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F99%3A02000063" target="_blank" >RIV/68378271:_____/99:02000063 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/99:02010121

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Laser deposition of CN x films combined with RF and hollow cathode discharges.

Original language description

Pulsed laser deposition combined with additional RF and hollow cathod discharges for deposition of CNx films are studied. Films were characterized by WDX, XRD and by microhardness testers.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/GA202%2F93%2F0464" target="_blank" >GA202/93/0464: Research of Processes of Laser Thin Film Deposition</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

1999

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Superficies y Vacio

ISSN

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e-ISSN

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Volume of the periodical

9

Issue of the periodical within the volume

N/A

Country of publishing house

MX - MEXICO

Number of pages

3

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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