Selected properties of a-C:H PACVD coatings

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F09%3A00159105" target="_blank" >RIV/68407700:21220/09:00159105 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Selected properties of a-C:H PACVD coatings

Original language description

The a-C:H films were deposited by rf PACVD from methane and their growth rate, thermal treatment, morphology, adhesion and electrical passivation properties were investigated. Deposition at room temperature gave the highest film growth rates. The Raman spectra obtained for a-C:H films indicated that the D peak becomes more pronounced as the annealing temperature grows higher. The rf plasma produced a-C:H passivation films are sufficiently insulating at voltages up to ca. 2200 V.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

JK - Corrosion and material surfaces

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Applied Surface Science

ISSN

0169-4332

e-ISSN

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Volume of the periodical

256

Issue of the periodical within the volume

S

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

4

Pages from-to

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UT code for WoS article

000272030200006

EID of the result in the Scopus database

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