Structural and morphological nature of Ti-Si layers
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F25%3A00387568" target="_blank" >RIV/68407700:21220/25:00387568 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Structural and morphological nature of Ti-Si layers
Original language description
The structure and morphology of binary Ti-Si thin films were studied. Ti-Si surface alloys were deposited by electron beam. The Si content was controlled by the evaporation rate of Ti and Si targets. The structure was investigated by X-ray diffraction (XRD) and the morphology and surface roughness were measured by atomic force microscopy (AFM). The results show that the morphology and surface roughness reflect the structural evolution. The crystalline nature of Ti-Si thin films tends to nanocrystalline form. Higher amounts of Si resulted in an amorphous structure with a smoothed surface morphology and the lowest roughness.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2025
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů