Influence of the target composition on reactively sputtered titanium oxide films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F09%3A00156659" target="_blank" >RIV/68407700:21230/09:00156659 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Influence of the target composition on reactively sputtered titanium oxide films
Original language description
Titanium dioxide thin films have many interesting properties and are used in various applications. High refractive index of titania makes it attractive for the glass coating industry, where it is used in low-emission and antireflective coatings. Magnetron sputtering is the most common deposition technique for large area coatings. It has been shown previously that high rate can be achieved using substoichiometric targets TiOx. This work deals with reactive magnetron sputtering of titanium oxide films from targets of different composition. The DC deposition process with targets of different oxygen content has been investigated. The deposition rate and hysteresis behaviour is reported. The elemental compositions and structures of deposited films were evaluated by means of X-ray photoelectron spectroscopy, elastic recoil detection analysis and X-ray diffraction.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JJ - Other materials
OECD FORD branch
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Project
<a href="/en/project/GP106%2F07%2FP014" target="_blank" >GP106/07/P014: Self-lubricating coatings based on transition metal dichalcogenides</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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