Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F11%3A00184412" target="_blank" >RIV/68407700:21230/11:00184412 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.tsf.2011.06.021" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2011.06.021</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2011.06.021" target="_blank" >10.1016/j.tsf.2011.06.021</a>
Alternative languages
Result language
angličtina
Original language name
Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
Original language description
In the further development of reactive sputter deposition, strategies which allow for stabilization of the transition zone between the metallic and compound modes, elimination of the process hysteresis, and increase of the deposition rate, are of particular interest. In this study, the hysteresis behavior and the characteristics of the transition zone during reactive high power impulse magnetron sputtering (HiPIMS) of Al and Ce targets in an Ar-O2 atmosphere as a function of the pulsing frequency and the pumping speed are investigated. Comparison with reactive direct current magnetron sputtering (DCMS) reveals that HiPIMS allows for elimination/suppression of the hysteresis and a smoother transition from the metallic to the compound sputtering mode. For the experimental conditions employed in the present study, optimum behavior with respect to the hysteresis width is obtained at frequency values between 2 and 4 kHz.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JI - Composite materials
OECD FORD branch
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Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
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Volume of the periodical
519
Issue of the periodical within the volume
22
Country of publishing house
CH - SWITZERLAND
Number of pages
6
Pages from-to
7779-7784
UT code for WoS article
000295057000027
EID of the result in the Scopus database
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