2D sliding bench for lithographic exposure
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F14%3A00222312" target="_blank" >RIV/68407700:21230/14:00222312 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
2D sliding bench for lithographic exposure
Original language description
The paper describes construction and applicability of the two dimensional sliding bench. It can be used for precise adjustment in the plane during the lithographical exposure of the substrate. It is applicable for exposure on the gel mask or direct exposure to the final substrate. It was developed mainly for preparing of the simple microelectromechanical structures for the gas sensors (SAW structures, application of active substances for conductivity sensors, micromechanical structures adjustment and trimming). Light exposure is provided via the lens and enlarged pattern for a given wavelength (these optical components are not a part of the bench). The bench allows replication of one structure over a larger area of the mask (substrate) and automated intensity setting and timing. The bench can also be used for direct writing of simple structures into the photo-resist.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
<a href="/en/project/VG20102015015" target="_blank" >VG20102015015: Miniature intelligent system for analyzing concentrations of gases and pollutants, particularly toxic</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Electronic Devices and Systems IMAPS CS International Conference 2014
ISBN
978-80-214-4985-5
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
42-46
Publisher name
Vysoké učení technické v Brně, Fakulta elektrotechniky a komunikačních technologií
Place of publication
Brno
Event location
Brno
Event date
Jun 25, 2014
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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