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Optimization of SiC Power p-i-n Diode Parameters by Proton Irradiation

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F18%3A00322920" target="_blank" >RIV/68407700:21230/18:00322920 - isvavai.cz</a>

  • Result on the web

    <a href="https://ieeexplore.ieee.org/document/8452157/" target="_blank" >https://ieeexplore.ieee.org/document/8452157/</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1109/TED.2018.2866763" target="_blank" >10.1109/TED.2018.2866763</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Optimization of SiC Power p-i-n Diode Parameters by Proton Irradiation

  • Original language description

    Local lifetime reduction by proton irradiation was used to optimize static and dynamic parameters of a 10 kV SiC p-i-n diode. Carrier lifetime was reduced locally at the anode side by irradiation with 800 keV protons at fluences up to 1e11 cm-2. Results show that proton irradiation followed by annealing at 370ºC can be used for local and controllable reduction of carrier lifetime in SiC devices. The dominant recombination center is the Z1/2 defect, whose distribution can be set by irradiation energy and fluence. Proton irradiation substantially improves diode turn OFF while its effect on the forward voltage drop and leakage is not so harmful. Comparison of the technology curve for the unirradiated and proton irradiated p-i-n diode then clearly show that proton irradiation provides a superior trade-off between the static and dynamic losses.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20201 - Electrical and electronic engineering

Result continuities

  • Project

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2018

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    IEEE Transactions on Electron Devices

  • ISSN

    0018-9383

  • e-ISSN

    1557-9646

  • Volume of the periodical

    65

  • Issue of the periodical within the volume

    10

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    7

  • Pages from-to

    4483-4489

  • UT code for WoS article

    000445239700062

  • EID of the result in the Scopus database

    2-s2.0-85052809067