Optimization of SiC Power p-i-n Diode Parameters by Proton Irradiation
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F18%3A00322920" target="_blank" >RIV/68407700:21230/18:00322920 - isvavai.cz</a>
Result on the web
<a href="https://ieeexplore.ieee.org/document/8452157/" target="_blank" >https://ieeexplore.ieee.org/document/8452157/</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1109/TED.2018.2866763" target="_blank" >10.1109/TED.2018.2866763</a>
Alternative languages
Result language
angličtina
Original language name
Optimization of SiC Power p-i-n Diode Parameters by Proton Irradiation
Original language description
Local lifetime reduction by proton irradiation was used to optimize static and dynamic parameters of a 10 kV SiC p-i-n diode. Carrier lifetime was reduced locally at the anode side by irradiation with 800 keV protons at fluences up to 1e11 cm-2. Results show that proton irradiation followed by annealing at 370ºC can be used for local and controllable reduction of carrier lifetime in SiC devices. The dominant recombination center is the Z1/2 defect, whose distribution can be set by irradiation energy and fluence. Proton irradiation substantially improves diode turn OFF while its effect on the forward voltage drop and leakage is not so harmful. Comparison of the technology curve for the unirradiated and proton irradiated p-i-n diode then clearly show that proton irradiation provides a superior trade-off between the static and dynamic losses.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20201 - Electrical and electronic engineering
Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
IEEE Transactions on Electron Devices
ISSN
0018-9383
e-ISSN
1557-9646
Volume of the periodical
65
Issue of the periodical within the volume
10
Country of publishing house
US - UNITED STATES
Number of pages
7
Pages from-to
4483-4489
UT code for WoS article
000445239700062
EID of the result in the Scopus database
2-s2.0-85052809067