Radiation Resistance of High-Voltage Silicon and 4H-SiC Power p-i-n Diodes
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F21%3A00344526" target="_blank" >RIV/68407700:21230/21:00344526 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1109/TED.2020.3038713" target="_blank" >https://doi.org/10.1109/TED.2020.3038713</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1109/TED.2020.3038713" target="_blank" >10.1109/TED.2020.3038713</a>
Alternative languages
Result language
angličtina
Original language name
Radiation Resistance of High-Voltage Silicon and 4H-SiC Power p-i-n Diodes
Original language description
The different effect of displacement damage produced by neutron irradiation on the static characteristics of 4.5-kV silicon and 4H silicon carbide (SiC) p-i-n power diodes is explained using deep level transient spectroscopy (DLTS), C–V profiling, and open-circuit voltage decay (OCVD) measurements. The number of introduced defects in SiC is higher, also the degradation of carrier lifetime and carrier removal proceeds more swiftly in SiC than those in silicon. However, smaller dimensions and a higher doping level of the n-base of the SiC diode compensate for these negative effects. As a result, the SiC p-i-n diode exhibits substantially higher resistance to neutron irradiation at higher fluences when the diode loses its ON-state carrier modulation capability. SiC also shows a negligible effect of irradiation on leakage current due to the wider bandgap. One may assume a better reliability of SiC bipolar devices over the silicon in a high neutron radiation environment.
Czech name
—
Czech description
—
Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
20201 - Electrical and electronic engineering
Result continuities
Project
—
Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
IEEE Transactions on Electron Devices
ISSN
0018-9383
e-ISSN
1557-9646
Volume of the periodical
68
Issue of the periodical within the volume
1
Country of publishing house
US - UNITED STATES
Number of pages
6
Pages from-to
202-207
UT code for WoS article
000602689000016
EID of the result in the Scopus database
2-s2.0-85097956319