Alternative Method to Thin-Film Thickness Determination Using the Spectral Reflectance Measurement
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F10%3A00176477" target="_blank" >RIV/68407700:21340/10:00176477 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Alternative Method to Thin-Film Thickness Determination Using the Spectral Reflectance Measurement
Original language description
An alternative, precise method of the reflectance spectrum measurement of a thin film on a wafer was developed. The method simply eliminates necessity to known the reflectance spectrum of reference mirror. The method was successfully tested on a SiO2 thin film on Si substrates.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of the 20th Joint Seminar on Development of Materials Science in Research and Education
ISBN
978-80-254-7237-8
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
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Publisher name
Czechoslovak Association for Crystal Growth
Place of publication
Prague
Event location
Bořetice
Event date
Sep 1, 2010
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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