Preparation of FeNiCoCrCu Thin Films by Ionized Jet Deposition Method: Determination of Elemental Transfer Coefficients

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F24%3A00375516" target="_blank" >RIV/68407700:21340/24:00375516 - isvavai.cz</a>

Result on the web

<a href="https://doi.org/10.3390/cryst14030263" target="_blank" >https://doi.org/10.3390/cryst14030263</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/cryst14030263" target="_blank" >10.3390/cryst14030263</a>

Result language

angličtina

Original language name

Preparation of FeNiCoCrCu Thin Films by Ionized Jet Deposition Method: Determination of Elemental Transfer Coefficients

Original language description

Investigation of high-entropy alloys in form of bulk samples as well as thin films is currently one of the fastest growing areas in the study of metal alloys. In this paper, a bulk sample of FeNiCoCuCr high-entropy alloy ingot with equimolar composition is prepared by the laboratory arc melting method under an argon atmosphere and used as a source target for deposition of thin films on Si (111) single-crystalline substrates using a novel ionized jet deposition method. The morphology, chemical composition, and real crystalline structure of the target and the prepared layers were characterized by scanning electron microscopy, atomic force microscopy, energy-dispersive X-ray spectroscopy, and X-ray and neutron diffraction methods. Transfer coefficients characterizing the mass transport between the target and the grown film were calculated for each of the constituting metallic elements as the ratio of the atomic concentration found in the prepared film divided by its concentration in the deposition target. The dependence of the obtained transfer coefficients on the IJD acceleration voltage is discussed with respect to the main physical and geometric parameters of the deposition process, and their correlations with the cohesive energy of the elements forming the HEA are proposed.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

20506 - Coating and films

Project

<a href="/en/project/GA21-05259S" target="_blank" >GA21-05259S: Nanostructured multilayers with controlled plasmonic response for sensor applications and quantum technologies</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2024

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Crystals

ISSN

2073-4352

e-ISSN

2073-4352

Volume of the periodical

14

Issue of the periodical within the volume

3

Country of publishing house

CH - SWITZERLAND

Number of pages

11

Pages from-to

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UT code for WoS article

001191569700001

EID of the result in the Scopus database

2-s2.0-85188753902