Phase Formation and Microstructure of Boron Nitride Thin Layers Deposited Using Nd:YAG and Krf Lasers

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21460%2F06%3A12121931" target="_blank" >RIV/68407700:21460/06:12121931 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Phase Formation and Microstructure of Boron Nitride Thin Layers Deposited Using Nd:YAG and Krf Lasers
Original language description
Boron nitride (BN) thin coatings were produced by means of the pulsed laser deposition technique from hexagonal BN (h-BN) target. Two types of laser i.e. Nd:YAG with Q-switch as well as KrF coupled with RF generator were used. Deposition performed by Nd:YAG laser on steel buffered with Ti substrates led to the formation of nanocrystalline strongly texturized h-BN layers. Substrate temperature or type of background gas comprising nitrogen, argon or a mixture of nitrogen and argon did not influence the surface morphology and phase composition. The deposition of BN on Ti6Al4V substrate covered with titanium nitride by means of the KrF laser enhanced by the RF generator produced layers with nano-composite structure, consisting of wurtzite (w-BN) phase particles located in a turbostratic (t-BN) and hexagonal (h-BN) matrix.
Czech name
Formování fáze a mikrostruktury BN tenkých vrstev připravených Nd:YAG laserem.
Czech description
Byly připraveny tenké vrstvy BN a bylo studováno formování fáze a mikrostruktury.

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Publication year
2006
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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