Deposition of Ag/a-C:H nanocomposite films with Ag surface enrichment

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11310%2F17%3A10366698" target="_blank" >RIV/00216208:11310/17:10366698 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11320/17:10366698

Výsledek na webu

<a href="http://dx.doi.org/10.1002/ppap.201600256" target="_blank" >http://dx.doi.org/10.1002/ppap.201600256</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/ppap.201600256" target="_blank" >10.1002/ppap.201600256</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Deposition of Ag/a-C:H nanocomposite films with Ag surface enrichment

Popis výsledku v původním jazyce

The nanocomposite films Ag/a-C:H were prepared by vacuum-based method which combines deposition of Ag nanoparticles by means of gas aggregation source (GAS) and PECVD deposition of a-C:H matrix. The matrix was deposited in a mixture of Ar and n-hexane on the substrates placed on the powered RF electrode facing the beam of Ag NPs from the GAS. Anisotropic plasma etching was used to increase Ag concentration on the surface of the coating. The influence of three types of plasma on the chemical composition of the coatings and on the size of Ag nanoparticles is described. It is shown that the best etching selectivity and thus the highest Ag surface concentration was reached in case of etching of grounded samples in low pressure oxygen plasma. This treatment enhances the short term antibacterial efficiency of produced coatings.

Název v anglickém jazyce

Deposition of Ag/a-C:H nanocomposite films with Ag surface enrichment

Popis výsledku anglicky

The nanocomposite films Ag/a-C:H were prepared by vacuum-based method which combines deposition of Ag nanoparticles by means of gas aggregation source (GAS) and PECVD deposition of a-C:H matrix. The matrix was deposited in a mixture of Ar and n-hexane on the substrates placed on the powered RF electrode facing the beam of Ag NPs from the GAS. Anisotropic plasma etching was used to increase Ag concentration on the surface of the coating. The influence of three types of plasma on the chemical composition of the coatings and on the size of Ag nanoparticles is described. It is shown that the best etching selectivity and thus the highest Ag surface concentration was reached in case of etching of grounded samples in low pressure oxygen plasma. This treatment enhances the short term antibacterial efficiency of produced coatings.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

<a href="/cs/project/GA13-09853S" target="_blank" >GA13-09853S: Aplikace nízkoteplotního plazmatu v klastrovém zdroji s agregací v plynu pro nanášení nanočástic, nanostrukturovaných a nanokompozitních vrstev</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Processes and Polymers

ISSN

1612-8850

e-ISSN

—

Svazek periodika

14

Číslo periodika v rámci svazku

11

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

8

Strana od-do

—

Kód UT WoS článku

000415339700003

EID výsledku v databázi Scopus

2-s2.0-85021285822