XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F11%3A10108201" target="_blank" >RIV/00216208:11320/11:10108201 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.apsusc.2011.09.025" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2011.09.025</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2011.09.025" target="_blank" >10.1016/j.apsusc.2011.09.025</a>

Jazyk výsledku

angličtina

Název v původním jazyce

XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina

Popis výsledku v původním jazyce

Alumina-supported mixed bimetallic Rh-V thin films, with the overall thickness of 0.8 ML, were prepared under the ultrahigh vacuum (UHV) conditions and characterized with respect to their electronic and CO adsorption properties. X-ray photoelectron spectroscopy (XPS) was utilized to characterize electronic changes accompanying bimetallic Rh-V interaction and interaction between metal and polycrystalline gamma-Al(2)O(3) substrate. The chemisorption properties were probed by temperature-programmed desorption spectroscopy (TPD) of CO molecules. The electronic and chemisorption properties of the mixed layers were compared with pure Rh and V layers grown on the same gamma-Al(2)O(3) substrate and with a model bimetallic Rh-V system prepared by V deposition on a polycrystalline Rh foil. By varying the preparation conditions, we observed a strong dependence of the studied properties on the position of the V atoms. The presence of V atoms on the surface led to a fast deactivation, while vanadiu

Název v anglickém jazyce

XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina

Popis výsledku anglicky

Alumina-supported mixed bimetallic Rh-V thin films, with the overall thickness of 0.8 ML, were prepared under the ultrahigh vacuum (UHV) conditions and characterized with respect to their electronic and CO adsorption properties. X-ray photoelectron spectroscopy (XPS) was utilized to characterize electronic changes accompanying bimetallic Rh-V interaction and interaction between metal and polycrystalline gamma-Al(2)O(3) substrate. The chemisorption properties were probed by temperature-programmed desorption spectroscopy (TPD) of CO molecules. The electronic and chemisorption properties of the mixed layers were compared with pure Rh and V layers grown on the same gamma-Al(2)O(3) substrate and with a model bimetallic Rh-V system prepared by V deposition on a polycrystalline Rh foil. By varying the preparation conditions, we observed a strong dependence of the studied properties on the position of the V atoms. The presence of V atoms on the surface led to a fast deactivation, while vanadiu

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

<a href="/cs/project/GD202%2F09%2FH041" target="_blank" >GD202/09/H041: Fyzika nanostruktur</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

—

Svazek periodika

258

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

6

Strana od-do

908-913

Kód UT WoS článku

000296525800042

EID výsledku v databázi Scopus

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