Low-pressure water vapour plasma treatment of surfaces for biomolecules decontamination

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F12%3A10124310" target="_blank" >RIV/00216208:11320/12:10124310 - isvavai.cz</a>

Výsledek na webu

<a href="http://iopscience.iop.org/0022-3727/45/13/135203/pdf/0022-3727_45_13_135203.pdf" target="_blank" >http://iopscience.iop.org/0022-3727/45/13/135203/pdf/0022-3727_45_13_135203.pdf</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0022-3727/45/13/135203" target="_blank" >10.1088/0022-3727/45/13/135203</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Low-pressure water vapour plasma treatment of surfaces for biomolecules decontamination

Popis výsledku v původním jazyce

Decontamination treatments of surfaces are performed on bacterial spores, albumin and brain homogenate used as models of biological contaminations in a low-pressure, inductively coupled plasma reactor operated with water-vapour-based gas mixtures. It isshown that removal of contamination can be achieved using pure H2O or Ar/H2O mixtures at low temperatures with removal rates comparable to oxygen-based mixtures. Particle fluxes (Ar+ ions, O and H atomic radicals and OH molecular radicals) from water vapour discharge are measured by optical emission spectroscopy and Langmuir probe under several operating conditions. Analysis of particle fluxes and removal rates measurements illustrates the role of ion bombardment associated with O radicals, governing the removal rates of organic matter. Auxiliary role of hydroxyl radicals is discussed on the basis of experimental data. The advantages of a water vapour plasma process are discussed for practical applications in medical devices decontamina

Název v anglickém jazyce

Low-pressure water vapour plasma treatment of surfaces for biomolecules decontamination

Popis výsledku anglicky

Decontamination treatments of surfaces are performed on bacterial spores, albumin and brain homogenate used as models of biological contaminations in a low-pressure, inductively coupled plasma reactor operated with water-vapour-based gas mixtures. It isshown that removal of contamination can be achieved using pure H2O or Ar/H2O mixtures at low temperatures with removal rates comparable to oxygen-based mixtures. Particle fluxes (Ar+ ions, O and H atomic radicals and OH molecular radicals) from water vapour discharge are measured by optical emission spectroscopy and Langmuir probe under several operating conditions. Analysis of particle fluxes and removal rates measurements illustrates the role of ion bombardment associated with O radicals, governing the removal rates of organic matter. Auxiliary role of hydroxyl radicals is discussed on the basis of experimental data. The advantages of a water vapour plasma process are discussed for practical applications in medical devices decontamina

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Physics D - Applied Physics

ISSN

0022-3727

e-ISSN

—

Svazek periodika

45

Číslo periodika v rámci svazku

13

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

9

Strana od-do

1-9

Kód UT WoS článku

000301880300008

EID výsledku v databázi Scopus

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