Characterization of thin CeO2 films electrochemically deposited on HOPG

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319583" target="_blank" >RIV/00216208:11320/15:10319583 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.apsusc.2015.01.198" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2015.01.198</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2015.01.198" target="_blank" >10.1016/j.apsusc.2015.01.198</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Characterization of thin CeO2 films electrochemically deposited on HOPG

Popis výsledku v původním jazyce

Electrodeposition is widely used for industrial applications to deposit thin films, coatings, and adhesion layers. Herein, CeO2 thin films were deposited on a highly oriented pyrolytic graphite (HOPG) substrate by cathodic electrodeposition. The influence of the deposition parameters on the yield and on the film morphology is studied and discussed. Morphology and composition of the electrodeposited films were characterized by in-situ atomic force microscopy (AFM), scanning electron microscopy (SEM), Energy Dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). By AFM we show that the thickness of CeO2 films can be controlled via the Ce3+ concentration in solution and the deposition time. After exposing the films to ambient air, cracking structures are formed, which were analyzed by AFM in detail. The chemical composition of the deposits was analyzed by XPS indicating the formation of nearly stoichiometric CeO2. (C) 2015 Elsevier B.V. All rights reserved.

Název v anglickém jazyce

Characterization of thin CeO2 films electrochemically deposited on HOPG

Popis výsledku anglicky

Electrodeposition is widely used for industrial applications to deposit thin films, coatings, and adhesion layers. Herein, CeO2 thin films were deposited on a highly oriented pyrolytic graphite (HOPG) substrate by cathodic electrodeposition. The influence of the deposition parameters on the yield and on the film morphology is studied and discussed. Morphology and composition of the electrodeposited films were characterized by in-situ atomic force microscopy (AFM), scanning electron microscopy (SEM), Energy Dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). By AFM we show that the thickness of CeO2 films can be controlled via the Ce3+ concentration in solution and the deposition time. After exposing the films to ambient air, cracking structures are formed, which were analyzed by AFM in detail. The chemical composition of the deposits was analyzed by XPS indicating the formation of nearly stoichiometric CeO2. (C) 2015 Elsevier B.V. All rights reserved.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

—

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

—

Svazek periodika

350

Číslo periodika v rámci svazku

30 Sep

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

7

Strana od-do

142-148

Kód UT WoS článku

000359166600025

EID výsledku v databázi Scopus

2-s2.0-84938750773