Thermally induced formation of metastable nanocomposites in amorphous Cr-Zr-O thin films deposited using reactive ion beam sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F16%3A10327266" target="_blank" >RIV/00216208:11320/16:10327266 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.tsf.2016.06.038" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2016.06.038</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2016.06.038" target="_blank" >10.1016/j.tsf.2016.06.038</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Thermally induced formation of metastable nanocomposites in amorphous Cr-Zr-O thin films deposited using reactive ion beam sputtering

Popis výsledku v původním jazyce

Successive crystallization of amorphous Cr-Zr-O thin films, formation of the (Cr,Zr)(2)O-3/(Zr, Cr)O-2 nanocomposites and the thermally induced changes in the hexagonal crystal structure of metastable (Cr, Zr)(2)O-3 were investigated by means of in situ high-temperature synchrotron diffraction experiments up to 1100 degrees C. The thin films were deposited at room temperature by using reactive ion beam sputtering, and contained 3-15 at.% Zr. At low Zr concentrations, chromium-rich (Cr,Zr)(2)O-3 crystallized first, while the crystallization of zirconium-rich (Zr,Cr)O-2 was retarded. Increasing amount of zirconium shifted the onset of crystallization in both phases to higher temperatures. For 3 at.% of zirconium in amorphous Cr-Zr-O, (Cr,Zr)(2)O-3 crystallized at 600 degrees C. At 8 at.% Zr in the films, the crystallization of (Cr,Zr)(2)O-3 started at 700 degrees C. At 15 at.% Zr, the Cr-Zr-O films remained amorphous up to the annealing temperature of 1000 degrees C. Metastable hexagonal (Cr,Zr)(2)O-3 accommodated up to similar to 3 at.% Zr. Excess of zirconium formed tetragonal zirconia, which was stabilized by chromium.

Název v anglickém jazyce

Thermally induced formation of metastable nanocomposites in amorphous Cr-Zr-O thin films deposited using reactive ion beam sputtering

Popis výsledku anglicky

Successive crystallization of amorphous Cr-Zr-O thin films, formation of the (Cr,Zr)(2)O-3/(Zr, Cr)O-2 nanocomposites and the thermally induced changes in the hexagonal crystal structure of metastable (Cr, Zr)(2)O-3 were investigated by means of in situ high-temperature synchrotron diffraction experiments up to 1100 degrees C. The thin films were deposited at room temperature by using reactive ion beam sputtering, and contained 3-15 at.% Zr. At low Zr concentrations, chromium-rich (Cr,Zr)(2)O-3 crystallized first, while the crystallization of zirconium-rich (Zr,Cr)O-2 was retarded. Increasing amount of zirconium shifted the onset of crystallization in both phases to higher temperatures. For 3 at.% of zirconium in amorphous Cr-Zr-O, (Cr,Zr)(2)O-3 crystallized at 600 degrees C. At 8 at.% Zr in the films, the crystallization of (Cr,Zr)(2)O-3 started at 700 degrees C. At 15 at.% Zr, the Cr-Zr-O films remained amorphous up to the annealing temperature of 1000 degrees C. Metastable hexagonal (Cr,Zr)(2)O-3 accommodated up to similar to 3 at.% Zr. Excess of zirconium formed tetragonal zirconia, which was stabilized by chromium.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

612

Číslo periodika v rámci svazku

Srpen

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

7

Strana od-do

430-436

Kód UT WoS článku

000380511900063

EID výsledku v databázi Scopus

2-s2.0-84975847382