Crystalline structure and morphology of TiO2 thin films deposited by means of hollow cathode plasma jet with supporting anode

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F16%3A10327282" target="_blank" >RIV/00216208:11320/16:10327282 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2016.02.026" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2016.02.026</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2016.02.026" target="_blank" >10.1016/j.surfcoat.2016.02.026</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Crystalline structure and morphology of TiO2 thin films deposited by means of hollow cathode plasma jet with supporting anode

Popis výsledku v původním jazyce

TiO2 thin films with developed structure were deposited by means of a hollow cathode plasma jet (HCPJ) in a DC regime with a supporting anode. The influence of the plasma temperature on the surface morphology and crystalline structure of the thin films under different deposition conditions was studied. Diagnostics of the thin films structure was carried out using XRD, SEM, EDX and TEM methods. One batch of samples was annealed at a temperature of 400 degrees C in atmospheric conditions as a comparison with the crystalline structure and morphology of unannealed samples. The presence of two crystalline polymorphs of rutile and anatase in the films was discussed. The vacuum system was improved for an extended deposition of non-conductive materials without terminating the discharge and cleaning of the deposition chamber. The aim of this investigation was to prepare the vacuum system for the fabrication of photo electrodes which are the main functional part in dye-sensitized solar cells. The test DSSCs (dye-sensitized solar cells) were prepared from low-cost materials (raspberry/hibiscus natural dye sensitizers and candle soot counter electrode) in order to check the quality of the films, with a highest conversion efficiency eta = 0.66% and a fill factor FF = 62%.

Název v anglickém jazyce

Crystalline structure and morphology of TiO2 thin films deposited by means of hollow cathode plasma jet with supporting anode

Popis výsledku anglicky

TiO2 thin films with developed structure were deposited by means of a hollow cathode plasma jet (HCPJ) in a DC regime with a supporting anode. The influence of the plasma temperature on the surface morphology and crystalline structure of the thin films under different deposition conditions was studied. Diagnostics of the thin films structure was carried out using XRD, SEM, EDX and TEM methods. One batch of samples was annealed at a temperature of 400 degrees C in atmospheric conditions as a comparison with the crystalline structure and morphology of unannealed samples. The presence of two crystalline polymorphs of rutile and anatase in the films was discussed. The vacuum system was improved for an extended deposition of non-conductive materials without terminating the discharge and cleaning of the deposition chamber. The aim of this investigation was to prepare the vacuum system for the fabrication of photo electrodes which are the main functional part in dye-sensitized solar cells. The test DSSCs (dye-sensitized solar cells) were prepared from low-cost materials (raspberry/hibiscus natural dye sensitizers and candle soot counter electrode) in order to check the quality of the films, with a highest conversion efficiency eta = 0.66% and a fill factor FF = 62%.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

<a href="/cs/project/GA15-00863S" target="_blank" >GA15-00863S: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

271

Číslo periodika v rámci svazku

květen

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

7

Strana od-do

123-129

Kód UT WoS článku

000374609900015

EID výsledku v databázi Scopus

2-s2.0-84962159936