Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F18%3A10370912" target="_blank" >RIV/00216208:11320/18:10370912 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/68378271:_____/18:00487414
Výsledek na webu
<a href="http://dx.doi.org/10.1107/S1600577517017362" target="_blank" >http://dx.doi.org/10.1107/S1600577517017362</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1107/S1600577517017362" target="_blank" >10.1107/S1600577517017362</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold
Popis výsledku v původním jazyce
The durability of grazing-and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20 degrees and 10 degrees grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16 degrees off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.
Název v anglickém jazyce
Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold
Popis výsledku anglicky
The durability of grazing-and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20 degrees and 10 degrees grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16 degrees off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10305 - Fluids and plasma physics (including surface physics)
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Ostatní
Rok uplatnění
2018
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Journal of Synchrotron Radiation [online]
ISSN
1600-5775
e-ISSN
—
Svazek periodika
2018
Číslo periodika v rámci svazku
25
Stát vydavatele periodika
JP - Japonsko
Počet stran výsledku
8
Strana od-do
77-84
Kód UT WoS článku
000418593300013
EID výsledku v databázi Scopus
2-s2.0-85038971075