CoO epitaxial growth on Cu(111) by reactive PVD and plasma oxidation

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F22%3A10456690" target="_blank" >RIV/00216208:11320/22:10456690 - isvavai.cz</a>

Výsledek na webu

<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=_z.RFfBa3G" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=_z.RFfBa3G</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfin.2022.102364" target="_blank" >10.1016/j.surfin.2022.102364</a>

Jazyk výsledku

angličtina

Název v původním jazyce

CoO epitaxial growth on Cu(111) by reactive PVD and plasma oxidation

Popis výsledku v původním jazyce

Heteroepitaxial layers of ordered cobalt monoxide were prepared on single crystal Cu(111) substrate by two physical deposition methods - reactive physical vapor deposition (PVD) of Co in pure oxygen and by step-wise oxygen plasma oxidation of small Co deposits. Volume and surface-specific diffraction methods were utilized to characterize the structure and orientation of the CoO thin films, the surface morphology of the PVD grown structures was probed by scanning tunneling microscopy (STM). Photoelectron spectroscopy (XPS) was used to monitor the chemical state of the samples during preparation stage, as well as during the following thermal treatments up to 700 K. At low oxygen pressures (below 1 x 10-4 Pa), unlike for some other single crystal surfaces, on Cu(111) only cobalt monoxide phase with rocksalt structure can be established. The resulting CoO thin film exhibits a 3-dimensional mesa-like character with large flat (111) terraces aligned with the (111) face of Cu substrate and shaped by (111) and (100) side facets. The natural surface polarity of the (111) facets of CoO is suggested to be compensated primarily by a presence of aliovalent surface Co3+ cations, forming an ultrathin surface spinel-like phase, and surface-bound hydroxyls.

Název v anglickém jazyce

CoO epitaxial growth on Cu(111) by reactive PVD and plasma oxidation

Popis výsledku anglicky

Heteroepitaxial layers of ordered cobalt monoxide were prepared on single crystal Cu(111) substrate by two physical deposition methods - reactive physical vapor deposition (PVD) of Co in pure oxygen and by step-wise oxygen plasma oxidation of small Co deposits. Volume and surface-specific diffraction methods were utilized to characterize the structure and orientation of the CoO thin films, the surface morphology of the PVD grown structures was probed by scanning tunneling microscopy (STM). Photoelectron spectroscopy (XPS) was used to monitor the chemical state of the samples during preparation stage, as well as during the following thermal treatments up to 700 K. At low oxygen pressures (below 1 x 10-4 Pa), unlike for some other single crystal surfaces, on Cu(111) only cobalt monoxide phase with rocksalt structure can be established. The resulting CoO thin film exhibits a 3-dimensional mesa-like character with large flat (111) terraces aligned with the (111) face of Cu substrate and shaped by (111) and (100) side facets. The natural surface polarity of the (111) facets of CoO is suggested to be compensated primarily by a presence of aliovalent surface Co3+ cations, forming an ultrathin surface spinel-like phase, and surface-bound hydroxyls.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/GA19-22636S" target="_blank" >GA19-22636S: Nanostrukturní katalyzátory bez přítomnosti drahých kovů pro environmentální a energetické aplikace</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surfaces and Interfaces

ISSN

2468-0230

e-ISSN

—

Svazek periodika

34

Číslo periodika v rámci svazku

Nov

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

11

Strana od-do

102364

Kód UT WoS článku

000869029000004

EID výsledku v databázi Scopus

2-s2.0-85138600648