Annealing Effects on Fractal Analysis and Optical Nonlinearity in Pulsed Laser-Deposited Plasmonic Cu Thin Films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F25%3A10503841" target="_blank" >RIV/00216208:11320/25:10503841 - isvavai.cz</a>

Výsledek na webu

<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=QhMn8BPdxi" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=QhMn8BPdxi</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/s11468-025-02835-6" target="_blank" >10.1007/s11468-025-02835-6</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Annealing Effects on Fractal Analysis and Optical Nonlinearity in Pulsed Laser-Deposited Plasmonic Cu Thin Films

Popis výsledku v původním jazyce

This study explores the effect of surface growth parameters on the plasmonic and nonlinear optical (NLO) properties of as-deposited and annealed copper (Cu) thin films. Growth parameters were derived from power spectral density functions (PSDFs) of AFM micrographs and modeled using a Gaussian approach with fractal characteristics to extract key surface metrics. The micro-roughness of as-deposited films annealed at 4-, 6-, and 8-min deposition durations increased from 0.27 to 8.57 nm, 0.95 to 7.29 nm, and 0.89 to 3.79 nm, respectively. With annealing, fractal behavior transitioned from extreme to Brownian, while activation energy exhibited two distinct values across temperature regimes, reflecting surface diffusion processes. Gradually annealed films showed both longitudinal and transverse plasmonic peaks in absorption spectra. Third-order NLO properties are analyzed via the Z-scan technique at 632.8 nm. While as-deposited films lacked detectable optical nonlinearity, annealed films exhibited positive nonlinear refractive indices (n2) on the order of 10-4 cm/W, increasing with annealing temperature. These results connect fractal surface morphology to enhanced plasmonic and NLO responses, offering insights for functional material design.

Název v anglickém jazyce

Annealing Effects on Fractal Analysis and Optical Nonlinearity in Pulsed Laser-Deposited Plasmonic Cu Thin Films

Popis výsledku anglicky

This study explores the effect of surface growth parameters on the plasmonic and nonlinear optical (NLO) properties of as-deposited and annealed copper (Cu) thin films. Growth parameters were derived from power spectral density functions (PSDFs) of AFM micrographs and modeled using a Gaussian approach with fractal characteristics to extract key surface metrics. The micro-roughness of as-deposited films annealed at 4-, 6-, and 8-min deposition durations increased from 0.27 to 8.57 nm, 0.95 to 7.29 nm, and 0.89 to 3.79 nm, respectively. With annealing, fractal behavior transitioned from extreme to Brownian, while activation energy exhibited two distinct values across temperature regimes, reflecting surface diffusion processes. Gradually annealed films showed both longitudinal and transverse plasmonic peaks in absorption spectra. Third-order NLO properties are analyzed via the Z-scan technique at 632.8 nm. While as-deposited films lacked detectable optical nonlinearity, annealed films exhibited positive nonlinear refractive indices (n2) on the order of 10-4 cm/W, increasing with annealing temperature. These results connect fractal surface morphology to enhanced plasmonic and NLO responses, offering insights for functional material design.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10402 - Inorganic and nuclear chemistry

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasmonics

ISSN

1557-1955

e-ISSN

1557-1963

Svazek periodika

2025

Číslo periodika v rámci svazku

březen

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

12

Strana od-do

nestránkováno

Kód UT WoS článku

001448796600001

EID výsledku v databázi Scopus

2-s2.0-105000408231