The influence of low-energy ion bombardment on the microstructure development and mechanical properties of TiBx coatings

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00055017" target="_blank" >RIV/00216224:14310/11:00055017 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.vacuum.2010.12.011" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2010.12.011</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2010.12.011" target="_blank" >10.1016/j.vacuum.2010.12.011</a>

Jazyk výsledku

angličtina

Název v původním jazyce

The influence of low-energy ion bombardment on the microstructure development and mechanical properties of TiBx coatings

Popis výsledku v původním jazyce

The influence of the deposition parameters on the growth, structure and mechanical properties of the TiBx coatings are studied. The TiBx coatings represent a nanocomposite system, in which random or oriented TiB2 nanocrystallites are embedded in an amorphous matrix as is revealed by cross-sectional transmission electron microscopy. We show that low-energy ion bombardment (Ei) of growing TiBx coating influences the preferred orientation of TiB2 crystallites. The increasing of ion current density (is) bymeans of negative substrate bias voltage (Us) leads to change from random to the (0001) preferred crystal orientation whereby the electrical biasing promotes crystal growth in the coating and the (0001) texture appears gradually during the film growth. Together with the (0001) preferred orientation selection the composition B/Ti ratio was changed from 2.9 (floating potential, Ei=8eV) to 2.4 (Ei=94eV).

Název v anglickém jazyce

The influence of low-energy ion bombardment on the microstructure development and mechanical properties of TiBx coatings

Popis výsledku anglicky

The influence of the deposition parameters on the growth, structure and mechanical properties of the TiBx coatings are studied. The TiBx coatings represent a nanocomposite system, in which random or oriented TiB2 nanocrystallites are embedded in an amorphous matrix as is revealed by cross-sectional transmission electron microscopy. We show that low-energy ion bombardment (Ei) of growing TiBx coating influences the preferred orientation of TiB2 crystallites. The increasing of ion current density (is) bymeans of negative substrate bias voltage (Us) leads to change from random to the (0001) preferred crystal orientation whereby the electrical biasing promotes crystal growth in the coating and the (0001) texture appears gradually during the film growth. Together with the (0001) preferred orientation selection the composition B/Ti ratio was changed from 2.9 (floating potential, Ei=8eV) to 2.4 (Ei=94eV).

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

—

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

—

Svazek periodika

85

Číslo periodika v rámci svazku

9

Stát vydavatele periodika

CZ - Česká republika

Počet stran výsledku

5

Strana od-do

866-870

Kód UT WoS článku

000289181700004

EID výsledku v databázi Scopus

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