Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F14%3A00073875" target="_blank" >RIV/00216224:14310/14:00073875 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering

Popis výsledku v původním jazyce

Standard ceramic materials nowadays used as protective coatings such as TiN, TiAlN, c-BN, etc., exhibit high hardness and high stiffness. However these are often connected to brittle behaviour of the coating thus limiting the lifetime of the coating andof the coated tool as well. To overcome these limitations, a new generation of materials with high hardness and moderate ductility is sought for. Recently, nanolaminate Mo2BC coatings were predicted to have these advantageousproperties. However deposition conditions so far necessary to deposit Mo2BC coatings are a limiting factor. First, deposition process utilizing combinatorial DC magnetron sputtering required substrate temperature of 900°C. Secondly, a low temperature synthesis method reducing the substrate temperature to 380°C required using HiPIMS with compound Mo2BC target [2]. Both of these methods pose significant problems with industrial scale production.

Název v anglickém jazyce

Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering

Popis výsledku anglicky

Standard ceramic materials nowadays used as protective coatings such as TiN, TiAlN, c-BN, etc., exhibit high hardness and high stiffness. However these are often connected to brittle behaviour of the coating thus limiting the lifetime of the coating andof the coated tool as well. To overcome these limitations, a new generation of materials with high hardness and moderate ductility is sought for. Recently, nanolaminate Mo2BC coatings were predicted to have these advantageousproperties. However deposition conditions so far necessary to deposit Mo2BC coatings are a limiting factor. First, deposition process utilizing combinatorial DC magnetron sputtering required substrate temperature of 900°C. Secondly, a low temperature synthesis method reducing the substrate temperature to 380°C required using HiPIMS with compound Mo2BC target [2]. Both of these methods pose significant problems with industrial scale production.

Druh

O - Ostatní výsledky

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů