Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F17%3A00094893" target="_blank" >RIV/00216224:14310/17:00094893 - isvavai.cz</a>

Výsledek na webu

<a href="http://iopscience.iop.org/article/10.1088/1361-6463/aa7e6d/meta" target="_blank" >http://iopscience.iop.org/article/10.1088/1361-6463/aa7e6d/meta</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6463/aa7e6d" target="_blank" >10.1088/1361-6463/aa7e6d</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS

Popis výsledku v původním jazyce

In this paper, comparison of standard and multi-pulse high power impulse magnetron sputtering is performed. The effective branching fraction method is used for titanium atom and ion number density determination, showing that the residual titanium atoms and ions from the preceding pulse are crucial for the subsequent pulse initiation and development. It is shown that the discharge current rises faster in the subsequent pulse, but does not reach the same maximum as in the preceding pulse. The time evolution of the titanium atom density shows different behaviour, initial increase is followed by decrease in the preceding pulse and a rather constant evolution during the subsequent pulse. As for the titanium ion number density, it reaches typically lower values in the subsequent pulse, approaching the maximum values from the preceding pulse only at long delays of 1.5 ms. The most significant increase of the total ion flux to the substrate, namely 43% increase with respect to standard high power impulse magnetron sputtering, is observed in the multi-pulse high power impulse magnetron sputtering with the shortest studied delay of 200 us. The residual titanium atoms produced by the preceding pulse are already thermalized at the beginning of the subsequent pulse, thus being available for ionization during the subsequent pulse. The reservoir of these thermalized atoms gets depleted as the delay increases. However, even for the longest studied delay of 1.5 ms the influence of the preceding pulse on the subsequent pulse is still distinct, including the enhancement of the total ion flux to the substrate by 23%.

Název v anglickém jazyce

Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS

Popis výsledku anglicky

In this paper, comparison of standard and multi-pulse high power impulse magnetron sputtering is performed. The effective branching fraction method is used for titanium atom and ion number density determination, showing that the residual titanium atoms and ions from the preceding pulse are crucial for the subsequent pulse initiation and development. It is shown that the discharge current rises faster in the subsequent pulse, but does not reach the same maximum as in the preceding pulse. The time evolution of the titanium atom density shows different behaviour, initial increase is followed by decrease in the preceding pulse and a rather constant evolution during the subsequent pulse. As for the titanium ion number density, it reaches typically lower values in the subsequent pulse, approaching the maximum values from the preceding pulse only at long delays of 1.5 ms. The most significant increase of the total ion flux to the substrate, namely 43% increase with respect to standard high power impulse magnetron sputtering, is observed in the multi-pulse high power impulse magnetron sputtering with the shortest studied delay of 200 us. The residual titanium atoms produced by the preceding pulse are already thermalized at the beginning of the subsequent pulse, thus being available for ionization during the subsequent pulse. The reservoir of these thermalized atoms gets depleted as the delay increases. However, even for the longest studied delay of 1.5 ms the influence of the preceding pulse on the subsequent pulse is still distinct, including the enhancement of the total ion flux to the substrate by 23%.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Physics D: Applied Physics

ISSN

0022-3727

e-ISSN

—

Svazek periodika

50

Číslo periodika v rámci svazku

36

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

12

Strana od-do

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Kód UT WoS článku

000415299900001

EID výsledku v databázi Scopus

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