Controlled fabrication and electrowetting properties of silicon nanostructures

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F17%3A00112267" target="_blank" >RIV/00216224:14310/17:00112267 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.tandfonline.com/doi/abs/10.1080/01694243.2016.1199340" target="_blank" >https://www.tandfonline.com/doi/abs/10.1080/01694243.2016.1199340</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1080/01694243.2016.1199340" target="_blank" >10.1080/01694243.2016.1199340</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Controlled fabrication and electrowetting properties of silicon nanostructures

Popis výsledku v původním jazyce

Electrowetting on dielectric is of particular interest in various applications including digital microFLuidics, optics, displays and inanalysis of biological samples. In this paper, Ag-assisted etching of silicon has been used to prepare superhydrophobic surfaces that may add unique properties to such devices. The porosity is controlled by controlling the size of the Ag deposited on the surface. Etching is carried out in HF/H2O2 solution. From the SEM images, the small-sized Ag particles are found to produce a very porous irregular surface, while the larger Ag-sized particles deposited resulted in regular vertical nanostructures. The fabricated surface was chemically modified with fluoro alkyl silane to make it superhydrophobic. Wetting behaviour was studied by measuring the contact angle and contact angle hysteresis. The contact angle measured was greater than 150 degrees and contact angle hysteresis was less than five. Electrowetting was studied by applying DC voltage between the droplet and silicon substrate.

Název v anglickém jazyce

Controlled fabrication and electrowetting properties of silicon nanostructures

Popis výsledku anglicky

Electrowetting on dielectric is of particular interest in various applications including digital microFLuidics, optics, displays and inanalysis of biological samples. In this paper, Ag-assisted etching of silicon has been used to prepare superhydrophobic surfaces that may add unique properties to such devices. The porosity is controlled by controlling the size of the Ag deposited on the surface. Etching is carried out in HF/H2O2 solution. From the SEM images, the small-sized Ag particles are found to produce a very porous irregular surface, while the larger Ag-sized particles deposited resulted in regular vertical nanostructures. The fabricated surface was chemically modified with fluoro alkyl silane to make it superhydrophobic. Wetting behaviour was studied by measuring the contact angle and contact angle hysteresis. The contact angle measured was greater than 150 degrees and contact angle hysteresis was less than five. Electrowetting was studied by applying DC voltage between the droplet and silicon substrate.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20900 - Industrial biotechnology

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY

ISSN

0169-4243

e-ISSN

1568-5616

Svazek periodika

31

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

31-40

Kód UT WoS článku

000386328700004

EID výsledku v databázi Scopus

2-s2.0-84976260236