The role of applied bias on the properties of HiPIMS deposited nc-TiC/a-C:H coatings

Kód výsledku v IS VaVaI

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Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

The role of applied bias on the properties of HiPIMS deposited nc-TiC/a-C:H coatings

Popis výsledku v původním jazyce

Nanocomposite coatings consisting of nanocrystallites embedded in an amorphous matrix such as nc-TiC/a-C:H can be tailored to exhibit an unusual combination of properties like high hardness and elastic modulus combined with low friction and wear. These coatings are usually deposited utilising direct current magnetron sputtering (DCMS) leading to low ionisation of the sputtered titanium and to lower Ar+ ion bombardment impinging the growing coating. The ion bombardment of the substrates is routinely enhanced via increasing the energy of the bombarding ions due to the application of a negative bias onto the samples. The use of high power impulse magnetron sputtering (HiPIMS) usually leads to much higher ionisation of the sputtered titanium which can alter the deposition process and to more severe ion bombardment of the growing coating changing the properties of the deposited coatings.

Název v anglickém jazyce

The role of applied bias on the properties of HiPIMS deposited nc-TiC/a-C:H coatings

Popis výsledku anglicky

Nanocomposite coatings consisting of nanocrystallites embedded in an amorphous matrix such as nc-TiC/a-C:H can be tailored to exhibit an unusual combination of properties like high hardness and elastic modulus combined with low friction and wear. These coatings are usually deposited utilising direct current magnetron sputtering (DCMS) leading to low ionisation of the sputtered titanium and to lower Ar+ ion bombardment impinging the growing coating. The ion bombardment of the substrates is routinely enhanced via increasing the energy of the bombarding ions due to the application of a negative bias onto the samples. The use of high power impulse magnetron sputtering (HiPIMS) usually leads to much higher ionisation of the sputtered titanium which can alter the deposition process and to more severe ion bombardment of the growing coating changing the properties of the deposited coatings.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů