Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F19%3A00109216" target="_blank" >RIV/00216224:14310/19:00109216 - isvavai.cz</a>

Výsledek na webu

<a href="https://iopscience.iop.org/article/10.1088/1361-6595/ab0363/pdf" target="_blank" >https://iopscience.iop.org/article/10.1088/1361-6595/ab0363/pdf</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/ab0363" target="_blank" >10.1088/1361-6595/ab0363</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene

Popis výsledku v původním jazyce

Reactive high power impulse magnetron sputtering offers a great opportunity for high quality coating production, thus understanding the processes accompanying deposition is of great importance. In this paper, the evolution of numerous discharge parameters such as total pressure, discharge current and sputtered species number densities are studied in argon with oxygen, nitrogen or acetylene admixture. The experiments are compared to the reactive direct current magnetron sputtering where the deposition process usually exhibits hysteresis behaviour and the ionization fraction of sputtered species is significantly lower. The decrease in the titanium atom and ion number densities with the increasing degree of target poisoning is detected for all the studied admixtures. However, while the sputtered species number densities decrease the sputtered species ionization fraction increases. Depending on the reactive gas admixture, the ionization fraction of the sputtered species increases from 75% achieved in pure argon discharge up to 90% attained in the poisoned mode of the reactive sputtering. This increase was the most pronounced for oxygen and nitrogen admixtures. Mutual comparison of the reactive sputtering with nitrogen, oxygen and acetylene indicated multiple causes for the observed increase.

Název v anglickém jazyce

Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene

Popis výsledku anglicky

Reactive high power impulse magnetron sputtering offers a great opportunity for high quality coating production, thus understanding the processes accompanying deposition is of great importance. In this paper, the evolution of numerous discharge parameters such as total pressure, discharge current and sputtered species number densities are studied in argon with oxygen, nitrogen or acetylene admixture. The experiments are compared to the reactive direct current magnetron sputtering where the deposition process usually exhibits hysteresis behaviour and the ionization fraction of sputtered species is significantly lower. The decrease in the titanium atom and ion number densities with the increasing degree of target poisoning is detected for all the studied admixtures. However, while the sputtered species number densities decrease the sputtered species ionization fraction increases. Depending on the reactive gas admixture, the ionization fraction of the sputtered species increases from 75% achieved in pure argon discharge up to 90% attained in the poisoned mode of the reactive sputtering. This increase was the most pronounced for oxygen and nitrogen admixtures. Mutual comparison of the reactive sputtering with nitrogen, oxygen and acetylene indicated multiple causes for the observed increase.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/LO1411" target="_blank" >LO1411: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

1361-6595

Svazek periodika

28

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

11

Strana od-do

1-11

Kód UT WoS článku

000460060600001

EID výsledku v databázi Scopus

2-s2.0-85065739855