Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14740%2F16%3A00093843" target="_blank" >RIV/00216224:14740/16:00093843 - isvavai.cz</a>

Výsledek na webu

<a href="http://onlinelibrary.wiley.com/doi/10.1002/ppap.201500078/abstract;jsessionid=786281515922DCBB841ACC7AB907CF9C.f04t01?systemMessage=Pay+per+view+article+purchase%28PPV%29+on+Wiley+Online+Library+will+be+unavailable+on+Saturday+11th+March+from+05%3A00-14%" target="_blank" >http://onlinelibrary.wiley.com/doi/10.1002/ppap.201500078/abstract;jsessionid=786281515922DCBB841ACC7AB907CF9C.f04t01?systemMessage=Pay+per+view+article+purchase%28PPV%29+on+Wiley+Online+Library+will+be+unavailable+on+Saturday+11th+March+from+05%3A00-14%</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/ppap.201500078" target="_blank" >10.1002/ppap.201500078</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Popis výsledku v původním jazyce

The deposition of functional plasma polymers such as a-C:H:O films is mainly influenced by fragmentation of the parent molecules in the gas phase as well as by the energetic conditions during film growth at the surface. The influence of gas phase and surface processes on the a-C:H:O film properties was thus investigated in order to optimize cross-linking and functional group density. The control of both conditions enables permanent functional plasma polymer films deposited within different reactor geometries (capacitively coupled symmetric vs. asymmetric at driven electrode and at grounded electrode). Comparison and up-scaling of such plasma polymerization processes are facilitated by knowing the internal energy input into the plasma and into the growing film surface.

Název v anglickém jazyce

Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Popis výsledku anglicky

The deposition of functional plasma polymers such as a-C:H:O films is mainly influenced by fragmentation of the parent molecules in the gas phase as well as by the energetic conditions during film growth at the surface. The influence of gas phase and surface processes on the a-C:H:O film properties was thus investigated in order to optimize cross-linking and functional group density. The control of both conditions enables permanent functional plasma polymer films deposited within different reactor geometries (capacitively coupled symmetric vs. asymmetric at driven electrode and at grounded electrode). Comparison and up-scaling of such plasma polymerization processes are facilitated by knowing the internal energy input into the plasma and into the growing film surface.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/ED1.1.00%2F02.0068" target="_blank" >ED1.1.00/02.0068: CEITEC - central european institute of technology</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma processes and polymers

ISSN

1612-8850

e-ISSN

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Svazek periodika

13

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

8

Strana od-do

279-286

Kód UT WoS článku

000370020100009

EID výsledku v databázi Scopus

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