Low-temperature growth of crystalline Tin(II) monosulfide thin films by atomic layer deposition using a liquid divalent tin precursor

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F21%3A39917534" target="_blank" >RIV/00216275:25310/21:39917534 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0169433221012289" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0169433221012289</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2021.150152" target="_blank" >10.1016/j.apsusc.2021.150152</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Low-temperature growth of crystalline Tin(II) monosulfide thin films by atomic layer deposition using a liquid divalent tin precursor

Popis výsledku v původním jazyce

In this study, better-quality stoichiometric SnS thin films were prepared by atomic layer deposition (ALD) using a liquid divalent Sn precursor, N, N&apos;-di-t-butyl-2-methylpropane-1,2-diamido tin(II) [Sn(dmpa)], and H2S. A relatively high growth per ALD cycle (GPC) value of approximately 0.13 nm/cycle was achieved at 125 degrees C. Furthermore, crystalline SnS films could be grown from room temperature (25 degrees C) to a high temperature of 250 degrees C. Density functional theory (DFT) calculations were used to examine the surface reactions and self-limiting nature of the Sn precursor. Mixed phases of cubic (pi) and orthorhombic (o) SnS films were deposited at low temperatures (25-100 degrees C), whereas only the orthorhombic phase prevailed at high growth temperatures (&gt;125 degrees C) based on the complementary results of X-ray diffractometry (XRD), Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS) analyses. The optoelectronic properties of the SnS films were further evaluated by spectroscopic ellipsometry (SE) analysis. The results from the SE analysis supported the observed change from mixed pi-SnS and o-SnS to o-SnS with increasing deposition temperature and allowed the determination of the energy bandgap (similar to 1.1 eV) and a relatively broad semi-transparent window (up to 3000 nm). Overall, this new ALD process for obtaining a good quality SnS is applicable even at room temperature (25 degrees C), and we foresee that this process could be of considerable interest for emerging applications.

Název v anglickém jazyce

Low-temperature growth of crystalline Tin(II) monosulfide thin films by atomic layer deposition using a liquid divalent tin precursor

Popis výsledku anglicky

In this study, better-quality stoichiometric SnS thin films were prepared by atomic layer deposition (ALD) using a liquid divalent Sn precursor, N, N&apos;-di-t-butyl-2-methylpropane-1,2-diamido tin(II) [Sn(dmpa)], and H2S. A relatively high growth per ALD cycle (GPC) value of approximately 0.13 nm/cycle was achieved at 125 degrees C. Furthermore, crystalline SnS films could be grown from room temperature (25 degrees C) to a high temperature of 250 degrees C. Density functional theory (DFT) calculations were used to examine the surface reactions and self-limiting nature of the Sn precursor. Mixed phases of cubic (pi) and orthorhombic (o) SnS films were deposited at low temperatures (25-100 degrees C), whereas only the orthorhombic phase prevailed at high growth temperatures (&gt;125 degrees C) based on the complementary results of X-ray diffractometry (XRD), Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS) analyses. The optoelectronic properties of the SnS films were further evaluated by spectroscopic ellipsometry (SE) analysis. The results from the SE analysis supported the observed change from mixed pi-SnS and o-SnS to o-SnS with increasing deposition temperature and allowed the determination of the energy bandgap (similar to 1.1 eV) and a relatively broad semi-transparent window (up to 3000 nm). Overall, this new ALD process for obtaining a good quality SnS is applicable even at room temperature (25 degrees C), and we foresee that this process could be of considerable interest for emerging applications.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20501 - Materials engineering

Projekt

<a href="/cs/project/LM2018103" target="_blank" >LM2018103: Výzkumná infrastruktura CEMNAT</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

1873-5584

Svazek periodika

565

Číslo periodika v rámci svazku

November

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

13

Strana od-do

150152

Kód UT WoS článku

000681177100002

EID výsledku v databázi Scopus

2-s2.0-85111039786