Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F24%3APU152195" target="_blank" >RIV/00216305:26210/24:PU152195 - isvavai.cz</a>

Výsledek na webu

<a href="https://pubs.acs.org/doi/10.1021/acsomega.4c06598" target="_blank" >https://pubs.acs.org/doi/10.1021/acsomega.4c06598</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1021/acsomega.4c06598" target="_blank" >10.1021/acsomega.4c06598</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography

Popis výsledku v původním jazyce

The behavior of plasmonic antennas is influenced by a variety of factors, including their size, shape, and material. Even minor changes in the deposition parameters during the thin film preparation process may have a significant impact on the dielectric function of the film, and thus on the plasmonic properties of the resulting antenna. In this work, we deposited gold thin films with thicknesses of 20, 30, and 40 nm at various deposition rates using an ion-beam-assisted deposition. We evaluate their morphology and crystallography by atomic force microscopy, X-ray diffraction, and transmission electron microscopy. Next, we examined the ease of fabricating plasmonic antennas using focused-ion-beam lithography. Finally, we evaluate their plasmonic properties by electron energy loss spectroscopy measurements of individual antennas. Our results show that the optimal gold thin film for plasmonic antenna fabrication of a thickness of 20 and 30 nm should be deposited at the deposition rate of around 0.1 nm/s. The thicker 40 nm film should be deposited at a higher deposition rate like 0.3 nm/s.

Název v anglickém jazyce

Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography

Popis výsledku anglicky

The behavior of plasmonic antennas is influenced by a variety of factors, including their size, shape, and material. Even minor changes in the deposition parameters during the thin film preparation process may have a significant impact on the dielectric function of the film, and thus on the plasmonic properties of the resulting antenna. In this work, we deposited gold thin films with thicknesses of 20, 30, and 40 nm at various deposition rates using an ion-beam-assisted deposition. We evaluate their morphology and crystallography by atomic force microscopy, X-ray diffraction, and transmission electron microscopy. Next, we examined the ease of fabricating plasmonic antennas using focused-ion-beam lithography. Finally, we evaluate their plasmonic properties by electron energy loss spectroscopy measurements of individual antennas. Our results show that the optimal gold thin film for plasmonic antenna fabrication of a thickness of 20 and 30 nm should be deposited at the deposition rate of around 0.1 nm/s. The thicker 40 nm film should be deposited at a higher deposition rate like 0.3 nm/s.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

21001 - Nano-materials (production and properties)

Projekt

<a href="/cs/project/EH22_008%2F0004572" target="_blank" >EH22_008/0004572: Kvantové materiály pro aplikace v udržitelných technologiích</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

ACS OMEGA

ISSN

2470-1343

e-ISSN

—

Svazek periodika

9

Číslo periodika v rámci svazku

35

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

9

Strana od-do

37408-37416

Kód UT WoS článku

001296000200001

EID výsledku v databázi Scopus

2-s2.0-85201690696