Plasmachemical Conservation of Corroded Metallic Objects

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F12%3APU99308" target="_blank" >RIV/00216305:26310/12:PU99308 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Plasmachemical Conservation of Corroded Metallic Objects

Popis výsledku v původním jazyce

Plasmachemical process for conservation of metallic objects is a new way of effective and fast treatment of corroded objects. This process consists of two main steps: corrosion removal and deposition of a protecting film. Removal of corrosion products isbased on plasmachemical reduction of corrosion layers by radio-frequency (RF) low pressure hydrogen plasma. Chosen barrier films are parylene (poly-para-xylylene) coatings and SiO2- like high density films. Parylene coatings are prepared by a standard chemical vapor deposition (CVD) method. Plasma enhanced chemical vapour deposition (PECVD) enables preparation of SiOx based thin films with higher flexibility due to variable incorporated organics groups. The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and barrier properties (OTR). The results from standard corrosion test were compared with those on samples treated by conventional conservation procedures.

Název v anglickém jazyce

Plasmachemical Conservation of Corroded Metallic Objects

Popis výsledku anglicky

Plasmachemical process for conservation of metallic objects is a new way of effective and fast treatment of corroded objects. This process consists of two main steps: corrosion removal and deposition of a protecting film. Removal of corrosion products isbased on plasmachemical reduction of corrosion layers by radio-frequency (RF) low pressure hydrogen plasma. Chosen barrier films are parylene (poly-para-xylylene) coatings and SiO2- like high density films. Parylene coatings are prepared by a standard chemical vapor deposition (CVD) method. Plasma enhanced chemical vapour deposition (PECVD) enables preparation of SiOx based thin films with higher flexibility due to variable incorporated organics groups. The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and barrier properties (OTR). The results from standard corrosion test were compared with those on samples treated by conventional conservation procedures.

Druh

O - Ostatní výsledky

CEP obor

AC - Archeologie, antropologie, etnologie

OECD FORD obor

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Projekt

<a href="/cs/project/DF11P01OVV004" target="_blank" >DF11P01OVV004: Plazmochemické procesy a technologie pro konzervaci kovových archeologických předmětů</a><br>

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů