Transparent Protective Coating by Plasma Polymerization of Vinyltrimethylsilane or Hexamethyldisilazane and Oxygen Post-treatment

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F14%3APU113717" target="_blank" >RIV/00216305:26310/14:PU113717 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Transparent Protective Coating by Plasma Polymerization of Vinyltrimethylsilane or Hexamethyldisilazane and Oxygen Post-treatment

Popis výsledku v původním jazyce

functional and well adhesive organic silicon thin film, which provides lower refractive index and the structure can be changed from organic to inorganic after oxygen plasma oxidation. In this study, we compared films deposited from RF plasma (13.56 MHz)vinyltetramethylsilane gas (VTMS, monomer) or hexamethyldisilazane (HMDSZ) on silicon wafers, PET, and glass sheet substrates. Substrates were post-treated by using oxygen plasma to create stable hydrophilic oxide surface. Results show that the growth rate of film thickness deposited on glass and silicon by VTMS or HMDSZ under 30W, 100mtorr, is about 14nm/min. The water contact angle of surface increased from 40 to about 90 degree, indicating the hydrophobic and kept stable for 10 days. However, after oxygen plasma post treatment, the surface turned from hydrophobic to hydrophilic, as water contact angle changed from 90 to about 15 degrees for HMDSZ (40 mtorr, 3 min, 25 W), and 25 degrees for VTMS(25W, 60mtorr, 5min). The transmittance

Název v anglickém jazyce

Transparent Protective Coating by Plasma Polymerization of Vinyltrimethylsilane or Hexamethyldisilazane and Oxygen Post-treatment

Popis výsledku anglicky

functional and well adhesive organic silicon thin film, which provides lower refractive index and the structure can be changed from organic to inorganic after oxygen plasma oxidation. In this study, we compared films deposited from RF plasma (13.56 MHz)vinyltetramethylsilane gas (VTMS, monomer) or hexamethyldisilazane (HMDSZ) on silicon wafers, PET, and glass sheet substrates. Substrates were post-treated by using oxygen plasma to create stable hydrophilic oxide surface. Results show that the growth rate of film thickness deposited on glass and silicon by VTMS or HMDSZ under 30W, 100mtorr, is about 14nm/min. The water contact angle of surface increased from 40 to about 90 degree, indicating the hydrophobic and kept stable for 10 days. However, after oxygen plasma post treatment, the surface turned from hydrophobic to hydrophilic, as water contact angle changed from 90 to about 15 degrees for HMDSZ (40 mtorr, 3 min, 25 W), and 25 degrees for VTMS(25W, 60mtorr, 5min). The transmittance

Druh

O - Ostatní výsledky

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

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Projekt

<a href="/cs/project/GCP205%2F12%2FJ058" target="_blank" >GCP205/12/J058: Syntéza anizotropních vrstev pomocí plazmové nanotechnologie</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů