Bismuth, by high-sensitivity low energy ion scattering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F23%3APU150406" target="_blank" >RIV/00216305:26620/23:PU150406 - isvavai.cz</a>

Výsledek na webu

<a href="https://pubs.aip.org/avs/sss/article/30/2/024201/2908438/Bismuth-by-high-sensitivity-low-energy-ion" target="_blank" >https://pubs.aip.org/avs/sss/article/30/2/024201/2908438/Bismuth-by-high-sensitivity-low-energy-ion</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/6.0002669" target="_blank" >10.1116/6.0002669</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Bismuth, by high-sensitivity low energy ion scattering

Popis výsledku v původním jazyce

Low energy ion scattering is an analytical technique with extreme surface sensitivity. It enables qualitative and quantitative elemental analy-sis of the outermost atomic layer. Straightforward quantification is possible by using well-defined reference samples, as the measured signal is related to known surface atomic concentration. Bi, like Pb, exhibits strong oscillatory behavior of backscattered ion yield when primary ion beam energy is varied. Here, we present the spectra of bismuth obtained by scattering of 4He+ ions in a wide range of energies (0.5-6.0 keV). These should cover a regularly used range of energies for He analysis and serve as standards or reference spectra for analysis of bismuth if the scattering angle is 145 degrees or similar. For this purpose, high-purity foil cleaned by ion sputtering was used. The sensitivity of the instrument in use (high-sensitivity low energy ion scattering spectrometer) is defined by the 3 keV4He+ spectrum of copper. The related atomic sensitivity and relative sensitivity factors are determined.

Název v anglickém jazyce

Bismuth, by high-sensitivity low energy ion scattering

Popis výsledku anglicky

Low energy ion scattering is an analytical technique with extreme surface sensitivity. It enables qualitative and quantitative elemental analy-sis of the outermost atomic layer. Straightforward quantification is possible by using well-defined reference samples, as the measured signal is related to known surface atomic concentration. Bi, like Pb, exhibits strong oscillatory behavior of backscattered ion yield when primary ion beam energy is varied. Here, we present the spectra of bismuth obtained by scattering of 4He+ ions in a wide range of energies (0.5-6.0 keV). These should cover a regularly used range of energies for He analysis and serve as standards or reference spectra for analysis of bismuth if the scattering angle is 145 degrees or similar. For this purpose, high-purity foil cleaned by ion sputtering was used. The sensitivity of the instrument in use (high-sensitivity low energy ion scattering spectrometer) is defined by the 3 keV4He+ spectrum of copper. The related atomic sensitivity and relative sensitivity factors are determined.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10301 - Atomic, molecular and chemical physics (physics of atoms and molecules including collision, interaction with radiation, magnetic resonances, Mössbauer effect)

Projekt

—

Návaznosti

—

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface Science Spectra

ISSN

1520-8575

e-ISSN

—

Svazek periodika

30

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

15

Strana od-do

1-15

Kód UT WoS článku

001057212500002

EID výsledku v databázi Scopus

2-s2.0-85169978102