The influence of aggressive environment with a high content of fluoride ions on the alloy TiAl6V4 with a protective Ti-Al-Si layer

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F25794787%3A_____%2F11%3A%230000285" target="_blank" >RIV/25794787:_____/11:#0000285 - isvavai.cz</a>

Výsledek na webu

—

DOI - Digital Object Identifier

—

Jazyk výsledku

angličtina

Název v původním jazyce

The influence of aggressive environment with a high content of fluoride ions on the alloy TiAl6V4 with a protective Ti-Al-Si layer

Popis výsledku v původním jazyce

This work presents results on the influence of fluoride ions on the behavior of layers whose main component is the phase TiAl0.3Si1.7 (called Tau 2 phase), formed on TiAl6V4 substrate. Layers were prepared in AlSi20 melt at 650 ° C for 60 min. Potentiodynamic curves were measured in a chloride solution with 0 and 5000 ppm fluoride. Layer were shifted corrosion potential to more negative values and at the some time reduce the corrosion current density (Im). Values of Im are in the potential range of 300? 1500 mV (SCE) for TiAl6V4 with Ti-Al-Si layers significantly lower in comparison with Im values found for TiAl6V4 in chloride solution containing 5000 F-. The electrochemical tests showed that Ti-Al-Si layer had marked positive effect on corrosion resistance of TiAl6V4 alloys in aggressive environment with high content of F-

Název v anglickém jazyce

The influence of aggressive environment with a high content of fluoride ions on the alloy TiAl6V4 with a protective Ti-Al-Si layer

Popis výsledku anglicky

This work presents results on the influence of fluoride ions on the behavior of layers whose main component is the phase TiAl0.3Si1.7 (called Tau 2 phase), formed on TiAl6V4 substrate. Layers were prepared in AlSi20 melt at 650 ° C for 60 min. Potentiodynamic curves were measured in a chloride solution with 0 and 5000 ppm fluoride. Layer were shifted corrosion potential to more negative values and at the some time reduce the corrosion current density (Im). Values of Im are in the potential range of 300? 1500 mV (SCE) for TiAl6V4 with Ti-Al-Si layers significantly lower in comparison with Im values found for TiAl6V4 in chloride solution containing 5000 F-. The electrochemical tests showed that Ti-Al-Si layer had marked positive effect on corrosion resistance of TiAl6V4 alloys in aggressive environment with high content of F-

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JK - Koroze a povrchové úpravy materiálu

OECD FORD obor

—

Projekt

—

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Advanced Materials Research

ISSN

1022-6680

e-ISSN

—

Svazek periodika

—

Číslo periodika v rámci svazku

2011

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

6

Strana od-do

—

Kód UT WoS článku

—

EID výsledku v databázi Scopus

—