Nový model růstu vrstev založený na průběhu jejich povrchové teploty během procesů magnetronového naprašování

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F07%3A00000428" target="_blank" >RIV/49777513:23520/07:00000428 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Novel model for film growth based on surface temperature developing during magnetron sputtering

Popis výsledku v původním jazyce

New physical phenomenon consisting in development of the surface temperature Tsurf, which being equal to the substrate temperature Ts at the beginning of deposition, steeply increases and becomes several times higher than Ts at the end of the process, isrevealed by means of IR-camera and new calorimetric method during sputter deposition of metal films. The reason for the phenomenon is the formation of a liquid-like layer on the growth surface with extremely low thermal conductivity. Variation in the film structure along thickness correlates with the variation in Tsurf. To explain these effects we developed a model according to which film grows by gas-liquid-solid rather than gas-solid mechanism which is realized provided that the film grows from energetic atoms.

Název v anglickém jazyce

Novel model for film growth based on surface temperature developing during magnetron sputtering

Popis výsledku anglicky

New physical phenomenon consisting in development of the surface temperature Tsurf, which being equal to the substrate temperature Ts at the beginning of deposition, steeply increases and becomes several times higher than Ts at the end of the process, isrevealed by means of IR-camera and new calorimetric method during sputter deposition of metal films. The reason for the phenomenon is the formation of a liquid-like layer on the growth surface with extremely low thermal conductivity. Variation in the film structure along thickness correlates with the variation in Tsurf. To explain these effects we developed a model according to which film grows by gas-liquid-solid rather than gas-solid mechanism which is realized provided that the film grows from energetic atoms.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2007

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

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Číslo periodika v rámci svazku

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Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

486

Kód UT WoS článku

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EID výsledku v databázi Scopus

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