High-performance thermochromic VO2-based coatings prepared on glass by a low-temperature scalable deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F21%3A43963133" target="_blank" >RIV/49777513:23520/21:43963133 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/49777513:23520/20:43960430

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

High-performance thermochromic VO2-based coatings prepared on glass by a low-temperature scalable deposition

Popis výsledku v původním jazyce

Three-layer thermochromic VO2-based coatings were prepared on soda-lime glass by a low-temperature scalable deposition technique. This deposition technique is based on reactive high-power impulse magnetron sputtering with a pulsed O2 flow control allowing us to prepare crystalline VO2 layers of the correct stoichiometry under highly industry-friendly deposition conditions: without any substrate bias at a low substrate temperature of 330 °C. Simultaneous doping of VO2 by W was performed to reduce the semiconductor-to-metal transition temperature to 20 °C. ZrO2 antireflection layers both below and above the thermochromic V0.982W0.018O2 layers were deposited at a low substrate temperature (&lt; 100 °C). A coating design utilizing a second-order interference in the ZrO2 layers was applied to increase both the luminous transmittance, Tlum, and the modulation of the solar transmittance, ΔTsol. The crystalline structure of the bottom ZrO2 layer further improved the VO2 crystallinity and the process reproducibility. The top ZrO2 layer provided the mechanical protection and environmental stability of the V0.982W0.018O2 layers. The ZrO2/ V0.982W0.018O2/ZrO2 coatings exhibited Tlum up to 60% at ΔTsol close to 6% for a V0.982W0.018O2 thickness of 45 nm, and Tlum up to 50% at ΔTsol above 10% for a V0.982W0.018O2 thickness of 69 nm.

Název v anglickém jazyce

High-performance thermochromic VO2-based coatings prepared on glass by a low-temperature scalable deposition

Popis výsledku anglicky

Three-layer thermochromic VO2-based coatings were prepared on soda-lime glass by a low-temperature scalable deposition technique. This deposition technique is based on reactive high-power impulse magnetron sputtering with a pulsed O2 flow control allowing us to prepare crystalline VO2 layers of the correct stoichiometry under highly industry-friendly deposition conditions: without any substrate bias at a low substrate temperature of 330 °C. Simultaneous doping of VO2 by W was performed to reduce the semiconductor-to-metal transition temperature to 20 °C. ZrO2 antireflection layers both below and above the thermochromic V0.982W0.018O2 layers were deposited at a low substrate temperature (&lt; 100 °C). A coating design utilizing a second-order interference in the ZrO2 layers was applied to increase both the luminous transmittance, Tlum, and the modulation of the solar transmittance, ΔTsol. The crystalline structure of the bottom ZrO2 layer further improved the VO2 crystallinity and the process reproducibility. The top ZrO2 layer provided the mechanical protection and environmental stability of the V0.982W0.018O2 layers. The ZrO2/ V0.982W0.018O2/ZrO2 coatings exhibited Tlum up to 60% at ΔTsol close to 6% for a V0.982W0.018O2 thickness of 45 nm, and Tlum up to 50% at ΔTsol above 10% for a V0.982W0.018O2 thickness of 69 nm.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

20506 - Coating and films

Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů