Strongly Thermochromic VO2-Based Smart Coatings for Room-Temperature Applications Prepared on Glass

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43973129" target="_blank" >RIV/49777513:23520/24:43973129 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Strongly Thermochromic VO2-Based Smart Coatings for Room-Temperature Applications Prepared on Glass

Popis výsledku v původním jazyce

The paper deals with a scalable sputter deposition technique for the preparation of strongly thermochromic YSZ/W and Sr co-doped VO2/SiO2 coatings on standard soda-lime glass at a relatively low substrate surface temperature (320 °C) and without any substrate bias voltage. The W and Sr co-doped VO2 layers were deposited using a controlled high-power impulse magnetron sputtering of a V-W target combined with a simultaneous pulsed DC magnetron sputtering of a Sr target in argon-oxygen gas mixtures. The bottom antireflection Y-stabilized ZrO2 (YSZ) layers were deposited using a controlled reactive high-power impulse magnetron sputtering of a Zr-Y target, while the top antireflection SiO2 layers were deposited using a reactive mid-frequency bipolar dual magnetron sputtering of two Si targets.

Název v anglickém jazyce

Strongly Thermochromic VO2-Based Smart Coatings for Room-Temperature Applications Prepared on Glass

Popis výsledku anglicky

The paper deals with a scalable sputter deposition technique for the preparation of strongly thermochromic YSZ/W and Sr co-doped VO2/SiO2 coatings on standard soda-lime glass at a relatively low substrate surface temperature (320 °C) and without any substrate bias voltage. The W and Sr co-doped VO2 layers were deposited using a controlled high-power impulse magnetron sputtering of a V-W target combined with a simultaneous pulsed DC magnetron sputtering of a Sr target in argon-oxygen gas mixtures. The bottom antireflection Y-stabilized ZrO2 (YSZ) layers were deposited using a controlled reactive high-power impulse magnetron sputtering of a Zr-Y target, while the top antireflection SiO2 layers were deposited using a reactive mid-frequency bipolar dual magnetron sputtering of two Si targets.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

20506 - Coating and films

Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů