Effect of argon ion sputter etching on the surface chemistry and surface properties of binary Ti-Nb alloys and commercially pure titanium

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A90238%2F25%3AN0000002" target="_blank" >RIV/60076658:90238/25:N0000002 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S2468023025025702" target="_blank" >https://www.sciencedirect.com/science/article/pii/S2468023025025702</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfin.2025.108317" target="_blank" >10.1016/j.surfin.2025.108317</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of argon ion sputter etching on the surface chemistry and surface properties of binary Ti-Nb alloys and commercially pure titanium

Popis výsledku v původním jazyce

The effect of argon ion sputter etching (Ar+) on Ti-Nb alloys with different niobium concentrations (Ti25Nb, Ti39Nb, and Ti55Nb) and distinct microstructures was investigated, using commercially pure titanium (CPTi) as a reference. The characterization included surface topography, surface morphology, chemistry, wettability, residual stress, and hardness to clarify the role of this process in the treatment of titanium materials for biomedical applications. Sputtering yields were additionally evaluated by Monte Carlo SDTrimSP simulations to complement the experiments. Etching exposed grain boundaries and generated intergranular height differences, with greater orientation diversity leading to increased surface roughness. The surface enrichment of niobium oxides after ion sputter etching rose with alloy niobium concentration and accordingly enhanced wettability. All Ti-Nb alloys exhibited a transition from hydrophobic to hydrophilic behavior. Moreover, ion sputter etching reduced residual stress, reflected by a decrease in surface hardness. Overall, the findings show that ion sputter etching, inherent to many PVD methods, has a decisive influence on the surface properties of Ti-Nb alloys and should be considered when designing surface treatments.

Název v anglickém jazyce

Effect of argon ion sputter etching on the surface chemistry and surface properties of binary Ti-Nb alloys and commercially pure titanium

Popis výsledku anglicky

The effect of argon ion sputter etching (Ar+) on Ti-Nb alloys with different niobium concentrations (Ti25Nb, Ti39Nb, and Ti55Nb) and distinct microstructures was investigated, using commercially pure titanium (CPTi) as a reference. The characterization included surface topography, surface morphology, chemistry, wettability, residual stress, and hardness to clarify the role of this process in the treatment of titanium materials for biomedical applications. Sputtering yields were additionally evaluated by Monte Carlo SDTrimSP simulations to complement the experiments. Etching exposed grain boundaries and generated intergranular height differences, with greater orientation diversity leading to increased surface roughness. The surface enrichment of niobium oxides after ion sputter etching rose with alloy niobium concentration and accordingly enhanced wettability. All Ti-Nb alloys exhibited a transition from hydrophobic to hydrophilic behavior. Moreover, ion sputter etching reduced residual stress, reflected by a decrease in surface hardness. Overall, the findings show that ion sputter etching, inherent to many PVD methods, has a decisive influence on the surface properties of Ti-Nb alloys and should be considered when designing surface treatments.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

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OECD FORD obor

10401 - Organic chemistry

Projekt

—

Návaznosti

—

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

SURFACES AND INTERFACES

ISSN

2468-0230

e-ISSN

—

Svazek periodika

Volume 80

Číslo periodika v rámci svazku

80

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

13

Strana od-do

n/a - n/a

Kód UT WoS článku

001643934600001

EID výsledku v databázi Scopus

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