Transition metal dichalcogenides (MoS2, MoSe2, WS2 and WSe2) exfoliation technique has strong influence upon their capacitance

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F15%3A43899775" target="_blank" >RIV/60461373:22310/15:43899775 - isvavai.cz</a>

Výsledek na webu

<a href="http://www.sciencedirect.com/science/article/pii/S1388248115000934" target="_blank" >http://www.sciencedirect.com/science/article/pii/S1388248115000934</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.elecom.2015.03.017" target="_blank" >10.1016/j.elecom.2015.03.017</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Transition metal dichalcogenides (MoS2, MoSe2, WS2 and WSe2) exfoliation technique has strong influence upon their capacitance

Popis výsledku v původním jazyce

Transition metal dichacogenides (TMD) represent an important class of layered compounds which are gaining lately an enormous interest in electrochemistry. Exfoliation of TMD materials to obtain single to few layer sheets is generally obtained through theintercalation of organolithium compounds. Here we investigated and compared the capacitive behavior of four representative TMD materials, i.e. MoS2, MoSe2, WS2 and WSe2 exfoliated with different organolithium intercalators, such as methyllithium (Me-Li), n-butyllithium (n-Bu-Li) and tert-butyllithium (t-Bu-Li). We found that both the metal/chalcogen composition and the type of intercalator strongly affect the capacitance of the exfoliated materials. These findings shall have profound implications on the construction of high-performance energy storage devices based on TMD.

Název v anglickém jazyce

Transition metal dichalcogenides (MoS2, MoSe2, WS2 and WSe2) exfoliation technique has strong influence upon their capacitance

Popis výsledku anglicky

Transition metal dichacogenides (TMD) represent an important class of layered compounds which are gaining lately an enormous interest in electrochemistry. Exfoliation of TMD materials to obtain single to few layer sheets is generally obtained through theintercalation of organolithium compounds. Here we investigated and compared the capacitive behavior of four representative TMD materials, i.e. MoS2, MoSe2, WS2 and WSe2 exfoliated with different organolithium intercalators, such as methyllithium (Me-Li), n-butyllithium (n-Bu-Li) and tert-butyllithium (t-Bu-Li). We found that both the metal/chalcogen composition and the type of intercalator strongly affect the capacitance of the exfoliated materials. These findings shall have profound implications on the construction of high-performance energy storage devices based on TMD.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CA - Anorganická chemie

OECD FORD obor

—

Projekt

<a href="/cs/project/GA15-09001S" target="_blank" >GA15-09001S: Chemické modifikace materiálů na bázi grafenu: Syntéza grafanu a halogengrafenu</a><br>

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Electrochemistry Communications

ISSN

1388-2481

e-ISSN

—

Svazek periodika

56

Číslo periodika v rámci svazku

JUL 2015

Stát vydavatele periodika

CZ - Česká republika

Počet stran výsledku

5

Strana od-do

24-28

Kód UT WoS článku

000356748700006

EID výsledku v databázi Scopus

—