Comparison of SIMS and RBS for depth profiling of silica glasses implanted with metal ions

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F16%3A43902119" target="_blank" >RIV/60461373:22310/16:43902119 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/67985882:_____/16:00464368 RIV/61389005:_____/16:00464368 RIV/26722445:_____/16:N0000028

Výsledek na webu

<a href="http://dx.doi.org/10.1116/1.4944525" target="_blank" >http://dx.doi.org/10.1116/1.4944525</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.4944525" target="_blank" >10.1116/1.4944525</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Comparison of SIMS and RBS for depth profiling of silica glasses implanted with metal ions

Popis výsledku v původním jazyce

Ion implantation of metal ions, followed by annealing, can be used for the formation of buried layers of metal nanoparticles in glasses. Thus, photonic structures with nonlinear optical properties can be formed. In this study, three samples of silica glasses were implanted with Cu+, Ag+, or Au+ ions under the same conditions (energy 330 keV and fluence 1 x 10(16) ions/cm(2)), and compared to three identical silica glass samples that were subsequently coimplanted with oxygen at the same depth. All the implanted glasses were annealed at 600 degrees C for 1 h, which leads to the formation of metal nanoparticles. The depth profiles of Cu, Ag, and Au were measured by Rutherford backscattering and by secondary ion mass spectrometry and the results are compared and discussed. (C) 2016 American Vacuum Society.

Název v anglickém jazyce

Comparison of SIMS and RBS for depth profiling of silica glasses implanted with metal ions

Popis výsledku anglicky

Ion implantation of metal ions, followed by annealing, can be used for the formation of buried layers of metal nanoparticles in glasses. Thus, photonic structures with nonlinear optical properties can be formed. In this study, three samples of silica glasses were implanted with Cu+, Ag+, or Au+ ions under the same conditions (energy 330 keV and fluence 1 x 10(16) ions/cm(2)), and compared to three identical silica glass samples that were subsequently coimplanted with oxygen at the same depth. All the implanted glasses were annealed at 600 degrees C for 1 h, which leads to the formation of metal nanoparticles. The depth profiles of Cu, Ag, and Au were measured by Rutherford backscattering and by secondary ion mass spectrometry and the results are compared and discussed. (C) 2016 American Vacuum Society.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BG - Jaderná, atomová a molekulová fyzika, urychlovače

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

JOURNAL OF VACUUM SCIENCE &amp; TECHNOLOGY B

ISSN

1071-1023

e-ISSN

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Svazek periodika

34

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

4

Strana od-do

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Kód UT WoS článku

000377673400029

EID výsledku v databázi Scopus

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