α-Fe2 O3 /TiO2 stratified photoanodes

Kód výsledku v IS VaVaI

RIV/60461373:22310/18:43916491 - isvavai.cz

Nalezeny alternativní kódy

RIV/68378271:_____/18:00500948 RIV/60461373:22350/18:43916491

Výsledek na webu

https://reader.elsevier.com/reader/sd/pii/S1010603017316337?token=E930FAC9B5032D52243EFDF14B747586796D2516F1369F596B5203305634EF8A5349FE136BC03D9C03687A1AA5FAEE0D

DOI - Digital Object Identifier

10.1016/j.jphotochem.2018.03.015

Jazyk výsledku

angličtina

Název v původním jazyce

α-Fe2 O3 /TiO2 stratified photoanodes

Popis výsledku v původním jazyce

Bilayer α-Fe2O3/TiO2 thin films were prepared with the aim of minimising photocorrosion of hematite. Conductive fluorine doped tin oxide (FTO)/glass was used as substrate for successive deposition of (i) α-Fe2O3 layers by high-power impulse magnetron sputtering (HIPIMS) and (ii) TiO2 (sol-gel method using dip-coating). The influence of annealing temperature (250–750 °C) and hematite layer thickness on the photoelectrochemical performance was evaluated. Hematite films on FTO substrates, calcined at 650 °C or 750 °C show increased photoelectrochemical response due to doping by Sn diffusion from the substrate. The photoresponse decreases with increasing thickness from 20 to 100 nm due to incomplete doping of the bulk. For bilayer hematite/TiO2 films, the visible light photoresponse is higher than that for the single hematite film which is ascribed to suppression of surface recombination at the Fe2O3/electrolyte junction by capping with TiO2. The Faradaic efficiency of the photocorrosion reaction was found to be 0.8% for an unprotected hematite electrode and decreased to 0.1% for a hematite electrode covered with a 65 nm thick layer of TiO2, thus proving the beneficial role of TiO2 in protecting hematite against photocorrosion

Název v anglickém jazyce

α-Fe2 O3 /TiO2 stratified photoanodes

Popis výsledku anglicky

Bilayer α-Fe2O3/TiO2 thin films were prepared with the aim of minimising photocorrosion of hematite. Conductive fluorine doped tin oxide (FTO)/glass was used as substrate for successive deposition of (i) α-Fe2O3 layers by high-power impulse magnetron sputtering (HIPIMS) and (ii) TiO2 (sol-gel method using dip-coating). The influence of annealing temperature (250–750 °C) and hematite layer thickness on the photoelectrochemical performance was evaluated. Hematite films on FTO substrates, calcined at 650 °C or 750 °C show increased photoelectrochemical response due to doping by Sn diffusion from the substrate. The photoresponse decreases with increasing thickness from 20 to 100 nm due to incomplete doping of the bulk. For bilayer hematite/TiO2 films, the visible light photoresponse is higher than that for the single hematite film which is ascribed to suppression of surface recombination at the Fe2O3/electrolyte junction by capping with TiO2. The Faradaic efficiency of the photocorrosion reaction was found to be 0.8% for an unprotected hematite electrode and decreased to 0.1% for a hematite electrode covered with a 65 nm thick layer of TiO2, thus proving the beneficial role of TiO2 in protecting hematite against photocorrosion

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10405 - Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis)

Projekt

GA17-20008S: Nové fotokatodové a photoanodové materiály pro solární rozklad vody

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Photochemistry and Photobiology A: Chemistry

ISSN

1010-6030

e-ISSN

—

Svazek periodika

366

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

6

Strana od-do

12-17

Kód UT WoS článku

000452577600003

EID výsledku v databázi Scopus

2-s2.0-85044277118