Selective modification of electrical insulator material by ion micro beam for the fabrication of circuit elements

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F20%3A43920409" target="_blank" >RIV/60461373:22310/20:43920409 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61389005:_____/20:00523923 RIV/44555601:13440/20:43895456

Výsledek na webu

<a href="https://www.tandfonline.com/doi/full/10.1080/10420150.2019.1701462" target="_blank" >https://www.tandfonline.com/doi/full/10.1080/10420150.2019.1701462</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1080/10420150.2019.1701462" target="_blank" >10.1080/10420150.2019.1701462</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Selective modification of electrical insulator material by ion micro beam for the fabrication of circuit elements

Popis výsledku v původním jazyce

Two well-established electrical insulators, graphene oxide and poly(methylmethacrylate) (PMMA) have been selectively exposed to controlled energy and fluence of ions. Ion micro beam has been proposed for processing of both graphene-based material and polymeric foils for tailoring of their properties. In a single step, the mask-less production of pattern on graphene-oxide and poly(methylmethacrylate) was realized at the Tandetron Laboratory of the Nuclear Physics Institute (Czech Republic) using a stream of 2.2 MeV alpha particles. Elements of a circuit were written on GO and poly(methylmethacrylate) in a controlled way using a software written in LabVIEW code. The induced deoxygenation, and dehydrogenation change the compositional, structural and electrical properties in the exposed samples. The accuracy of the method has been investigated by Rutherford backscattering spectrometry, elastic recoil detection analysis, Raman microscopy and the electrical standard two points method. © 2019, © 2019 Informa UK Limited, trading as Taylor &amp; Francis Group.

Název v anglickém jazyce

Selective modification of electrical insulator material by ion micro beam for the fabrication of circuit elements

Popis výsledku anglicky

Two well-established electrical insulators, graphene oxide and poly(methylmethacrylate) (PMMA) have been selectively exposed to controlled energy and fluence of ions. Ion micro beam has been proposed for processing of both graphene-based material and polymeric foils for tailoring of their properties. In a single step, the mask-less production of pattern on graphene-oxide and poly(methylmethacrylate) was realized at the Tandetron Laboratory of the Nuclear Physics Institute (Czech Republic) using a stream of 2.2 MeV alpha particles. Elements of a circuit were written on GO and poly(methylmethacrylate) in a controlled way using a software written in LabVIEW code. The induced deoxygenation, and dehydrogenation change the compositional, structural and electrical properties in the exposed samples. The accuracy of the method has been investigated by Rutherford backscattering spectrometry, elastic recoil detection analysis, Raman microscopy and the electrical standard two points method. © 2019, © 2019 Informa UK Limited, trading as Taylor &amp; Francis Group.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10402 - Inorganic and nuclear chemistry

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Radiation Effects and Defects in Solids

ISSN

1042-0150

e-ISSN

—

Svazek periodika

175

Číslo periodika v rámci svazku

3-4

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

11

Strana od-do

307-317

Kód UT WoS článku

000522130000008

EID výsledku v databázi Scopus

2-s2.0-85082590761