Properties of thiolate monolayers formed on different amalgam electrodes

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F11%3A00358449" target="_blank" >RIV/61388955:_____/11:00358449 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.jelechem.2011.01.017" target="_blank" >http://dx.doi.org/10.1016/j.jelechem.2011.01.017</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jelechem.2011.01.017" target="_blank" >10.1016/j.jelechem.2011.01.017</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Properties of thiolate monolayers formed on different amalgam electrodes

Popis výsledku v původním jazyce

Formation and properties of thiol (HS(CH2)10COOH or HS(CH2)10CH3) monolayers were investigated at stationary electrodes based on silver, copper, bismuth and cadmium solid amalgams covered by a mercury meniscus or by a mercury film (m-AgSAE, MF-AgSAE, m-CuSAE, m-BiAgSAE and m-CdSAE). For comparison, parallel experiments were performed at a classical hanging mercury drop electrode (HMDE). Thiol monolayers were prepared at an optimal deposition potential (e.g., for HS(CH2)10COOH Eac = 350 mV for HMDE and silver amalgam electrodes, Eac = 750 to 800 mV for m-CuSAE and m-BiAgSAE, and Eac = 1050 mV for m-CdSAE) at which the formed layers exhibit high density and stability. It was found that the potential of a reductive desorption peak of a thiol monolayer strongly depends on the metal which forms the amalgam (for HS(CH2)10COOH: Ep = 864 to 859 mV for HMDE and silver amalgam electrodes, Em-BiAgSAE = 1079 mV, Em-CuSAE = 1136 mV and Em-CdSAE = 1248 mV).

Název v anglickém jazyce

Properties of thiolate monolayers formed on different amalgam electrodes

Popis výsledku anglicky

Formation and properties of thiol (HS(CH2)10COOH or HS(CH2)10CH3) monolayers were investigated at stationary electrodes based on silver, copper, bismuth and cadmium solid amalgams covered by a mercury meniscus or by a mercury film (m-AgSAE, MF-AgSAE, m-CuSAE, m-BiAgSAE and m-CdSAE). For comparison, parallel experiments were performed at a classical hanging mercury drop electrode (HMDE). Thiol monolayers were prepared at an optimal deposition potential (e.g., for HS(CH2)10COOH Eac = 350 mV for HMDE and silver amalgam electrodes, Eac = 750 to 800 mV for m-CuSAE and m-BiAgSAE, and Eac = 1050 mV for m-CdSAE) at which the formed layers exhibit high density and stability. It was found that the potential of a reductive desorption peak of a thiol monolayer strongly depends on the metal which forms the amalgam (for HS(CH2)10COOH: Ep = 864 to 859 mV for HMDE and silver amalgam electrodes, Em-BiAgSAE = 1079 mV, Em-CuSAE = 1136 mV and Em-CdSAE = 1248 mV).

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CG - Elektrochemie

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Electroanalytical Chemistry

ISSN

1572-6657

e-ISSN

—

Svazek periodika

653

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

7

Strana od-do

7-13

Kód UT WoS článku

000288722600002

EID výsledku v databázi Scopus

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