Decomposition of Fluorinated Graphene under Heat Treatment

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F16%3A00462166" target="_blank" >RIV/61388955:_____/16:00462166 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1002/chem.201600901" target="_blank" >http://dx.doi.org/10.1002/chem.201600901</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/chem.201600901" target="_blank" >10.1002/chem.201600901</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Decomposition of Fluorinated Graphene under Heat Treatment

Popis výsledku v původním jazyce

Fluorination modifies the electronic properties of graphene, and thus it can be used to provide material with on-demand properties. However, the thermal stability of fluorinated graphene is crucial for any application in electronic devices. Herein, X-ray photoelectron spectroscopy (XPS), temperature-programmed desorption (TPD), and Raman spectroscopy were used to address the impact of the thermal treatment on fluorinated graphene. The annealing, at up to 700 K, caused gradual loss of fluorine and carbon, as was demonstrated by XPS. This loss was associated with broad desorption of CO and HF species, as monitored by TPD. The minor single desorption peak of CF species at 670 K is suggested to rationalize defect formation in the fluorinated graphene layer during the heating. However, fluorine removal from graphene was not complete, as some fraction of strongly bonded fluorine can persist despite heating to 1000 K. The role of intercalated H2O and OH species in the defluorination process is emphasised.

Název v anglickém jazyce

Decomposition of Fluorinated Graphene under Heat Treatment

Popis výsledku anglicky

Fluorination modifies the electronic properties of graphene, and thus it can be used to provide material with on-demand properties. However, the thermal stability of fluorinated graphene is crucial for any application in electronic devices. Herein, X-ray photoelectron spectroscopy (XPS), temperature-programmed desorption (TPD), and Raman spectroscopy were used to address the impact of the thermal treatment on fluorinated graphene. The annealing, at up to 700 K, caused gradual loss of fluorine and carbon, as was demonstrated by XPS. This loss was associated with broad desorption of CO and HF species, as monitored by TPD. The minor single desorption peak of CF species at 670 K is suggested to rationalize defect formation in the fluorinated graphene layer during the heating. However, fluorine removal from graphene was not complete, as some fraction of strongly bonded fluorine can persist despite heating to 1000 K. The role of intercalated H2O and OH species in the defluorination process is emphasised.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

—

Projekt

<a href="/cs/project/GAP208%2F12%2F1062" target="_blank" >GAP208/12/1062: Spektroskopie a spektroelektrochemie grafenu a grafenových multivrtsev</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Chemistry A European Journal

ISSN

1521-3765

e-ISSN

—

Svazek periodika

22

Číslo periodika v rámci svazku

26

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

8

Strana od-do

8990-8997

Kód UT WoS článku

000380270500038

EID výsledku v databázi Scopus

2-s2.0-84968615892