Positive ionization and electron attachment of hexafluoropropylene oxide in different cluster environments

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F19%3A00495943" target="_blank" >RIV/61388955:_____/19:00495943 - isvavai.cz</a>

Výsledek na webu

<a href="http://hdl.handle.net/11104/0288792" target="_blank" >http://hdl.handle.net/11104/0288792</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.ijms.2018.10.018" target="_blank" >10.1016/j.ijms.2018.10.018</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Positive ionization and electron attachment of hexafluoropropylene oxide in different cluster environments

Popis výsledku v původním jazyce

The hexafluoropropylene oxide, C3F6O (HFPO), is commonly used in technological processes involving low-temperature plasmas. In relevance to such processes, we investigate the electron ionization and attachment to HFPO molecules in various cluster environments. Either pure (HFPO)N clusters or the clusters deposited on larger argon nanoparticles (HFPO)N·ArM are generated in molecular beams in vacuum. The cluster beam is intercepted with a beam of either slow (0–15 eV) or faster (70 eV) electrons, yielding negative or positive ions, respectively, and their mass spectra are recorded. Qualitatively, the spectra of free and Ar-deposited clusters are similar, exhibiting the same ion fragments. The cluster environment suppresses the fragmentation after ionization for both positively and negatively charged clusters, namely, the parent ions (HFPO)n+/− are present in the spectra. The fragmentation is more suppressed in the Ar-deposited clusters. In both the positive ionization and attachment, new fragmentation channels or ion-molecule reactions in the clusters lead to production of new fragments not observed in the gas phase. Mechanisms of these reactions and ionization processes are discussed.

Název v anglickém jazyce

Positive ionization and electron attachment of hexafluoropropylene oxide in different cluster environments

Popis výsledku anglicky

The hexafluoropropylene oxide, C3F6O (HFPO), is commonly used in technological processes involving low-temperature plasmas. In relevance to such processes, we investigate the electron ionization and attachment to HFPO molecules in various cluster environments. Either pure (HFPO)N clusters or the clusters deposited on larger argon nanoparticles (HFPO)N·ArM are generated in molecular beams in vacuum. The cluster beam is intercepted with a beam of either slow (0–15 eV) or faster (70 eV) electrons, yielding negative or positive ions, respectively, and their mass spectra are recorded. Qualitatively, the spectra of free and Ar-deposited clusters are similar, exhibiting the same ion fragments. The cluster environment suppresses the fragmentation after ionization for both positively and negatively charged clusters, namely, the parent ions (HFPO)n+/− are present in the spectra. The fragmentation is more suppressed in the Ar-deposited clusters. In both the positive ionization and attachment, new fragmentation channels or ion-molecule reactions in the clusters lead to production of new fragments not observed in the gas phase. Mechanisms of these reactions and ionization processes are discussed.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10403 - Physical chemistry

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

International Journal of Mass Spectrometry

ISSN

1387-3806

e-ISSN

—

Svazek periodika

435

Číslo periodika v rámci svazku

JAN 2019

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

6

Strana od-do

145-150

Kód UT WoS článku

000453773300019

EID výsledku v databázi Scopus

2-s2.0-85055551911